Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 2/20 | 0.39 |
| ▸ | CA1 | P00915 | 2/20 | 0.39 |
| ▸ | CA2 | P00918 | 2/20 | 0.39 |
| ▸ | CA9 | Q16790 | 2/20 | 0.39 |
| ▸ | HTR2A | P28223 | 6/20 | 0.37 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | HRH1 | P35367 | 5/20 | 0.34 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
| ▸ | SCN4A | P35499 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.31 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28661133 | 0.77 | CA12 (0.37) | CA12CA1CA2CA9HTR2A | |
| SCHEMBL28883496 | 0.77 | CA12 (0.37) | CA12CA1CA2CA9HTR2A | |
| SCHEMBL4169446 | 0.72 | CA12 (0.42) | CA12CA1CA2CA9HTR2A | |
| SCHEMBL2238107 | 0.72 | CA12 (0.42) | CA12CA1CA2CA9HTR2A | |
| SCHEMBL705912 | 0.72 | CA12 (0.42) | CA12CA1CA2CA9HTR2A | |
| SCHEMBL704842 | 0.72 | CA12 (0.42) | CA12CA1CA2CA9HTR2A | |
| SCHEMBL3894510 | 0.72 | HTR2A (0.46) | CA12CA1CA2CA9HTR2A | |
| SCHEMBL8644599 | 0.72 | CA12 (0.43) | CA12CA1CA2CA9HTR2A | |
| SCHEMBL2449398 | 0.71 | TSHR (0.37) | HTR2ACYP2C19ALDH1A1TSHRHRH1 | |
| SCHEMBL703382 | 0.71 | CA12 (0.41) | CA12CA1CA2CA9HTR2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 268 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12331164-B2 | Curable siloxane resin composition | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2025-06-17 | — | — | US | claimed |
| CN-115181223-B | Low-gloss matte auxiliary agent, preparation method thereof and molded body | 铨盛聚碳科技股份有限公司 | 2023-08-29 | — | — | CN | claimed |
| WO-2023072128-A1 | COLORANT COMPOSITION AND COATED ARTICLE | GUANGDONG HUARUN PAINTS CO., LTD. (CN) | 2023-05-04 | — | — | WO | claimed |
| US-20230078587-A1 | CURABLE SILOXANE RESIN COMPOSITION | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2023-03-16 | — | — | US | claimed |
| CN-113956727-A | Colorant composition and coated article | 广东华润涂料有限公司 | 2022-01-21 | — | — | CN | claimed |
| CN-110734552-B | Preparation method of high-purity silicon carbide polycrystalline powder source precursor | 哈尔滨工业大学 | 2021-12-14 | — | — | CN | claimed |
| CN-110734552-A | Preparation method of high-purity silicon carbide polycrystalline powder source precursors | 哈尔滨工业大学 | 2020-01-31 | — | — | CN | claimed |
| EP-2791241-B1 | POLYHYDROXY CURABLE FLUOROELASTOMER COMPOSITIONS | CHEMOURS CO FC LLC (US) | 2018-11-28 | — | — | EP | claimed |
| EP-2791241-A1 | POLYHYDROXY CURABLE FLUOROELASTOMER COMPOSITIONS | E. I. Du Pont de Nemours and Company (US) | 2014-10-22 | — | — | EP | claimed |
| EP-2470574-B1 | PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION | BRIDGESTONE CORP (JP) | 2014-09-17 | — | — | EP | claimed |
| US-20070077782-A1 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| WO-2006091264-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2006-08-31 | — | — | WO | claimed |
| EP-1390972-B1 | METHOD OF FABICATING LOW-DIELECTRIC CONSTANT INTERLEVEL DIELECTRIC FILMS FOR BEOL INTERCONNECTS WITH ENHANCED ADHESION AND LOW-DEFECT DENSITY | IBM (US) | 2006-07-12 | — | — | EP | claimed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | claimed |
| US-6710450-B2 | Interconnect structure with precise conductor resistance and method to form same | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-03-23 | — | — | US | claimed |
| EP-1390972-A2 | METHOD OF FABICATING LOW-DIELECTRIC CONSTANT INTERLEVEL DIELECTRIC FILMS FOR BEOL INTERCONNECTS WITH ENHANCED ADHESION AND LOW-DEFECT DENSITY | International Business Machines Corporation (US) | 2004-02-25 | — | — | EP | claimed |
| US-20020160600-A1 | Method of fabricating low-dielectric constant interlevel dielectric films for BEOL interconnects with enhanced adhesion and low-defect density | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2002-10-31 | — | — | US | claimed |
| US-6455443-B1 | APPLYING UNIFORM COATING OF SILANE COUPLING AGENT CONTAINING POLYMERIZABLE GROUP TO SURFACE OF SUBSTRATE, HEATING TO PROVIDE MODIFIED SURFACE LAYER CONTAINING SI-O BONDS, RINSING WITH SOLVENT TO REMOVE UNREACTED COUPLER, APPLYING DIELECTRIC | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-09-24 | — | — | US | claimed |
| WO-2002069381-A2 | METHOD OF FABRICATING LOW-DIELECTRIC CONSTANT INTERLEVEL DIELECTRIC FILMS FOR BEOL INTERCONNECTS WITH ENHANCED ADHESION AND LOW-DEFECT DENSITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2002-09-06 | — | — | WO | claimed |
| US-20020117737-A1 | Interconnect structure with precise conductor resistance and method to form same | INTERNATIONAL BUSINESS CORPORATION (US) | 2002-08-29 | — | — | US | claimed |