⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29653700 | 1.00 | — | — | |
| Lithium Ion SCHEMBL3803036 | 0.87 | — | — | |
| Zinc Ion SCHEMBL29744636 | 0.87 | — | — | |
| SCHEMBL6883078 | 0.87 | — | — | |
| SCHEMBL4377473 | 0.87 | — | — | |
| SCHEMBL9561468 | 0.87 | — | — | |
| Lithium Ion SCHEMBL29744531 | 0.87 | — | — | |
| SCHEMBL29424305 | 0.87 | — | — | |
| SCHEMBL1069028 | 0.87 | — | — | |
| SCHEMBL30991439 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260123073-A1 | IMAGE SENSOR | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-30 | — | — | US | claimed |
| CN-120114340-A | Preparation method of composite powder, product and application | 上海上美化妆品股份有限公司 | 2025-06-10 | — | — | CN | claimed |
| CN-119951510-A | Multiphase Co for photocatalytic degradation of anionic dyexAlO4Catalyst | 汕头大学 | 2025-05-09 | — | — | CN | claimed |
| US-12240946-B2 | Polyamide moulding compositions for glass composites | EMS-PATENT AG (CH) | 2025-03-04 | — | — | US | claimed |
| CN-119517952-A | Positive electrode active material, method of preparing the same, positive electrode including the same, and rechargeable lithium battery | 三星SDI株式会社 | 2025-02-25 | — | — | CN | claimed |
| CN-118888737-B | Coating modified cathode material and preparation method and application thereof | 浙江帕瓦新能源股份有限公司 | 2025-02-07 | — | — | CN | claimed |
| CN-119170427-A | Self-supporting integrated oxygen vacancy heterogeneous site independent electrode and preparation method and application thereof | 台州学院 | 2024-12-20 | — | — | CN | claimed |
| CN-118888737-A | Coating modified cathode material and preparation method and application thereof | 浙江帕瓦新能源股份有限公司 | 2024-11-01 | — | — | CN | claimed |
| CN-118335956-A | Modified lithium cobalt oxide positive electrode material, preparation method and application thereof | 宜昌邦普时代新能源有限公司 | 2024-07-12 | — | — | CN | claimed |
| CN-112745669-B | Composite material, method for producing same and use thereof | 埃姆斯化学股份公司 | 2024-06-25 | — | — | CN | claimed |
| US-20040162374-A1 | Method of analysing a temperature indicating paints using a marker paint | ROLLS-ROYCE PLC (GB) | 2004-08-19 | — | — | US | claimed |
| EP-1447431-A1 | A method of analysing a temperature indicating paint using a marker paint | ROLLS-ROYCE PLC (GB) | 2004-08-18 | — | — | EP | claimed |
| US-6259212-B1 | Plasma display panel | SAMSUNG SDI CO., LTD. (KR) | 2001-07-10 | — | — | US | claimed |
| CN-1283866-A | Plasma displaying panel | SAMSUNG SDI CO LTD (KR) | 2001-02-14 | — | — | CN | claimed |
| EP-1067574-A1 | Plasma display panel | Samsung SDI Co., Ltd. (KR) | 2001-01-10 | — | — | EP | claimed |
| US-5763519-A | COMPRESSED SINTERED FLUOROPOLYMERS DOPED WITH PIGMENTS | LABSPHERE, INC. (US) | 1998-06-09 | — | — | US | claimed |
| US-5614267-A | ABRASION RESISTANCE, FLAME SPRAYING | EUTECTIC CORPORATION (US) | 1997-03-25 | — | — | US | claimed |
| EP-0117935-B1 | A HIGH EMISSIVITY REFRACTORY COATING, PROCESS FOR MANUFACTURING SAME, AND COATING COMPOSITION THEREFOR | Kato, Seiichi (JP) | 1986-09-17 | — | — | EP | claimed |
| EP-0117935-A1 | A high emissivity refractory coating, process for manufacturing same, and coating composition therefor | Kato, Seiichi (JP) | 1984-09-12 | — | — | EP | claimed |
| US-4469721-A | INCRFEASING ENERGY EFFICIENCY OF FURNACES | SUN FLATS, INC., A CORP OF JAPAN | 1984-09-04 | — | — | US | claimed |