⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL83842 | 0.91 | — | — | |
| SCHEMBL10424515 | 0.88 | TSHR (0.36) | — | |
| SCHEMBL869234 | 0.88 | TSHR (0.36) | — | |
| SCHEMBL7256828 | 0.88 | TSHR (0.36) | — | |
| SCHEMBL10424506 | 0.88 | TSHR (0.36) | — | |
| SCHEMBL10422689 | 0.88 | TSHR (0.36) | — | |
| SCHEMBL10424082 | 0.88 | TSHR (0.36) | — | |
| SCHEMBL1388013 | 0.88 | TSHR (0.36) | — | |
| SCHEMBL43570 | 0.88 | TSHR (0.36) | — | |
| SCHEMBL2277027 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 210 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4130147-A1 | COMPOSITION, FILM, AND OPTICAL SENSOR | FUJIFILM Corporation (JP) | 2023-02-08 | — | — | EP | claimed |
| US-4666513-A | Process for the selective extraction of copper using 4-acyl-(3H)-pyrazol-3-ones | SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) | 1987-05-19 | — | — | US | claimed |
| CN-118325004-A | Phenolic hydroxyl group-containing resin, photosensitive resin composition, curable composition, and resist film | DIC株式会社 | 2024-07-12 | — | — | CN | disclosed |
| US-20240226132-A1 | RNA COMPOSITIONS COMPRISING A BUFFER SUBSTANCE AND METHODS FOR PREPARING, STORING AND USING THE SAME | BIONTECH DELIVERY TECHNOLOGIES GMBH (DE) | 2024-07-11 | — | — | US | disclosed |
| WO-2024133635-A1 | COMPOSITION | BIONTECH DELIVERY TECHNOLOGIES GMBH (DE) | 2024-06-27 | — | — | WO | disclosed |
| CN-118201905-A | Cationic lipid | 武田药品工业株式会社 | 2024-06-14 | — | — | CN | disclosed |
| US-20240191009-A1 | POLYFUNCTIONALIZED HIGH-CIS 1,4-POLYBUTADIENE AND METHOD FOR MANUFACTURING THE SAME | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2024-06-13 | — | — | US | disclosed |
| EP-4366024-A1 | NON-AQUEOUS ELECTROLYTE AND LITHIUM SECONDARY BATTERY USING SAME | LG Energy Solution, Ltd. (KR) | 2024-05-08 | — | — | EP | disclosed |
| CN-117795730-A | Nonaqueous electrolyte and lithium secondary battery using the same | 株式会社LG新能源 | 2024-03-29 | — | — | CN | disclosed |
| US-20240093002-A1 | CURABLE COMPOSITION AND OPTICAL MATERIAL COMPRISING SAME | LG CHEM, LTD. (KR) | 2024-03-21 | — | — | US | disclosed |
| US-11924979-B2 | Resin composition, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer and semiconductor device | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-03-05 | — | — | US | disclosed |
| EP-0226304-A1 | Composition containing a penem or carbapenem antibiotic | SANKYO COMPANY LIMITED (JP) | 1987-06-24 | — | — | EP | disclosed |
| EP-0209126-A2 | Hydrocarbyl(polyphenol)-poly(2,2,6,6-tetramethyl piperidyl-1,3,5-triazines) as stabilizers for synthetic polymer compositions | ADEKA ARGUS CHEMICAL CO., Ltd. (JP) | 1987-01-21 | — | — | EP | disclosed |
| US-4615912-A | Providing hydrophobic surfaces on hydrophilic inorganic materials with metal glycolates | ADEKA ARGUS CHEMICAL CO., LTD., (JP) | 1986-10-07 | — | — | US | disclosed |
| EP-0092674-B1 | TRIAZOLE DERIVATIVES, PROCESS FOR THEIR PREPARATION AND FUNGICIDES CONTAINING THEM | BASF Aktiengesellschaft (DE) | 1985-11-06 | — | — | EP | disclosed |
| EP-0133702-A2 | Providing hydrophobic surfaces on hydrophilic inorganic materials with metal glycolates | ADEKA ARGUS CHEMICAL CO., Ltd. (JP) | 1985-03-06 | — | — | EP | disclosed |
| EP-0092674-A1 | Triazole derivatives, process for their preparation and fungicides containing them | BASF Aktiengesellschaft (DE) | 1983-11-02 | — | — | EP | disclosed |
| US-4076537-A | Light-sensitive materials containing organo tellurium or selenium compounds and sensitizers | FUJI PHOTO FILM CO., LTD. (JA) | 1978-02-28 | — | — | US | disclosed |
| US-4076530-A | Dry photographic copying method for producing Te images | FUJI PHOTO FILM CO., LTD. (JA) | 1978-02-28 | — | — | US | disclosed |
| US-4062685-A | ORGANO-TELLURIUM COMPOUND | FUJI PHOTO FILM CO., LTD. (JA) | 1977-12-13 | — | — | US | disclosed |