SCHEMBL8354940

SCHEMBL8354940

C=C(I)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8925633 0.72
SCHEMBL960022 0.70
SCHEMBL12341391 0.68
SCHEMBL2461096 0.67
SCHEMBL95520 0.67
SCHEMBL1667694 0.67
SCHEMBL23621 0.67
SCHEMBL888166 0.67
SCHEMBL107405 0.67
SCHEMBL140787 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250069948-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS LAM RESEARCH CORPORATION (US) 2025-02-27 US claimed
EP-4448831-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS Lam Research Corporation (US) 2024-10-23 EP claimed
CN-118434908-A Metal deposition in recessed features using halogen-containing deposition inhibitors 朗姆研究公司 2024-08-02 CN claimed
WO-2023114640-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS LAM RESEARCH CORPORATION (US) 2023-06-22 WO claimed
US-20260136848-A1 DEPOSITION OF METAL-CONTAINING FILMS LAM RES CORP (US) 2026-05-14 US disclosed
US-20250069948-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS LAM RESEARCH CORPORATION (US) 2025-02-27 US disclosed
EP-4448831-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS Lam Research Corporation (US) 2024-10-23 EP disclosed
CN-118434908-A Metal deposition in recessed features using halogen-containing deposition inhibitors 朗姆研究公司 2024-08-02 CN disclosed
WO-2024081263-A1 DEPOSITION OF METAL-CONTAINING FILMS LAM RESEARCH CORPORATION (US) 2024-04-18 WO disclosed
WO-2023114640-A1 DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS LAM RESEARCH CORPORATION (US) 2023-06-22 WO disclosed
US-20220126357-A1 MATERIALS, METHODS AND TECHNIQUES FOR SURFACE ALLOYING SAND CASTED ARTICLES UWM RESEARCH FOUNDATION, INC. 2022-04-28 US disclosed
WO-2021215057-A1 SINGLE CRYSTAL PRODUCTION APPARATUS AND SINGLE CRYSTAL PRODUCTION METHOD 株式会社SUMCO (JP) 2021-10-28 WO disclosed
US-20120125064-A1 BIOCHAR COMPLEX VENEARTH GROUP, LLC 2012-05-24 US disclosed
US-7459308-B2 Nucleic acid molecule encoding a CLASP-2 transmembrane protein ARBOR VITA CORPORATION (US) 2008-12-02 US disclosed
US-20080017558-A1 Methods and Devices for Improved Aeration From Vertically-Orientated Submerged Membranes NORMAN ENTERPRISES, INC. 2008-01-24 US disclosed
EP-0933347-A1 Process for the preparation of a carboxylic acid DSM N.V. (NL) 1999-08-04 EP disclosed
WO-1999033779-A1 PROCESS FOR THE PREPARATION OF A CARBOXYLIC ACID DSM N.V. (NL) 1999-07-08 WO disclosed
EP-0837728-A1 SUPPORTED CARBONYLATION CATALYST DSM N.V. (NL) 1998-04-29 EP disclosed
WO-1997002091-A1 SUPPORTED CARBONYLATION CATALYST DSM N.V. (NL) 1997-01-23 WO disclosed
US-3953409-A ALFIN CATALYST, MOLECULAR WEIGHT REGULATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JA) 1976-04-27 US disclosed