SCHEMBL83596

SCHEMBL83596

CC1C(=O)NC(=O)C1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13557930 1.00
SCHEMBL1656999 1.00
SCHEMBL13285715 0.78
SCHEMBL16601566 0.78
SCHEMBL18722050 0.78
SCHEMBL5028278 0.78
SCHEMBL18896957 0.77 TSHR (0.36)
SCHEMBL18342514 0.77
SCHEMBL20233491 0.74 TSHR (0.32)
SCHEMBL13056731 0.74 TSHR (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 426 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4206205-B1 PREPARATION METHOD FOR PYRROLOPYRIMIDINE COMPOUND PRIMEGENE BEIJING CO LTD (CN) 2026-03-04 EP claimed
US-20230303578-A1 PREPARATION METHOD FOR PYRROLOPYRIMIDINE COMPOUND PRIMEGENE (BEIJING) CO., LTD. (CN) 2023-09-28 US claimed
EP-4206205-A1 PREPARATION METHOD FOR PYRROLOPYRIMIDINE COMPOUND Primegene (Beijing) Co., Ltd. (CN) 2023-07-05 EP claimed
WO-2022042577-A1 PREPARATION METHOD FOR PYRROLOPYRIMIDINE COMPOUND 北京普祺医药科技有限公司 2022-03-03 WO claimed
US-7132229-B2 Photothermographic material and image forming method FUJI PHOTO FILM CO., LTD (JP) 2006-11-07 US claimed
US-20060019207-A1 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2006-01-26 US claimed
EP-0378791-A2 3,4-Dimethyl-pyrrolidine derivatives NIHON TOKUSHU NOYAKU SEIZO K.K. (JP) 1990-07-25 EP claimed
EP-4206205-B1 PREPARATION METHOD FOR PYRROLOPYRIMIDINE COMPOUND PRIMEGENE BEIJING CO LTD (CN) 2026-03-04 EP disclosed
US-20240069257-A1 CHOLESTERIC LIQUID CRYSTAL LAYER, METHOD OF FORMING CHOLESTERIC LIQUID CRYSTAL LAYER, LAMINATE, LIGHT GUIDE ELEMENT, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2024-02-29 US disclosed
US-20240069257-A1 CHOLESTERIC LIQUID CRYSTAL LAYER, METHOD OF FORMING CHOLESTERIC LIQUID CRYSTAL LAYER, LAMINATE, LIGHT GUIDE ELEMENT, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2024-02-29 US disclosed
US-11828960-B2 Cholesteric liquid crystal layer, method of forming cholesteric liquid crystal layer, laminate, light guide element, and image display device FUJIFILM CORPORATION (JP) 2023-11-28 US disclosed
US-11828960-B2 Cholesteric liquid crystal layer, method of forming cholesteric liquid crystal layer, laminate, light guide element, and image display device FUJIFILM CORPORATION (JP) 2023-11-28 US disclosed
US-11782196-B2 Cholesteric liquid crystal layer and method for forming cholesteric liquid crystal layer FUJIFILM CORPORATION (JP) 2023-10-10 US disclosed
EP-0722119-A1 Image formation method FUJI PHOTO FILM CO., LTD. (JP) 1996-07-17 EP disclosed
EP-0299421-B1 Imide modified epoxy resins DOW CHEMICAL CO (US) 1996-03-13 EP disclosed
EP-0378791-A2 3,4-Dimethyl-pyrrolidine derivatives NIHON TOKUSHU NOYAKU SEIZO K.K. (JP) 1990-07-25 EP disclosed
US-4847348-A BINDERS, COATINGS THE DOW CHEMICAL COMPANY (US) 1989-07-11 US disclosed
EP-0299421-A2 Imide modified epoxy resins THE DOW CHEMICAL COMPANY (US) 1989-01-18 EP disclosed
US-4419443-A RIPENING IN PRESENCE OF AN IMIDE FUJI PHOTO FILM CO., LTD. (JP) 1983-12-06 US disclosed
US-4176231-A Process for preparing 3-exomethylenecepham sulfoxides LILLY INDUSTRIES LIMITED (GB) 1979-11-27 US disclosed