⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL57959 | 0.89 | — | — | |
| Oxirane SCHEMBL11606392 | 0.74 | — | — | |
| SCHEMBL3897134 | 0.55 | — | — | |
| Ethane SCHEMBL7607393 | 0.52 | — | — | |
| Ethane SCHEMBL313928 | 0.52 | — | — | |
| Ethane SCHEMBL23673679 | 0.52 | — | — | |
| Ethane SCHEMBL1537238 | 0.52 | — | — | |
| Ethane SCHEMBL3007449 | 0.52 | — | — | |
| Ethane SCHEMBL157425 | 0.52 | — | — | |
| Ethane SCHEMBL28627458 | 0.52 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-11119436-A | — | — | None | — | — | JP | disclosed |
| JP-H11119436-A | PHOTORESIST CLOSE ADHESION MATERIAL AND METHOD FOR FORMING PHOTORESIST FILM | MIYAZAKI OKI ELECTRIC CO LTD | 1999-04-30 | — | — | JP | disclosed |