⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL910422 | 0.72 | — | — | |
| SCHEMBL31261761 | 0.67 | — | — | |
| SCHEMBL678849 | 0.65 | — | — | |
| SCHEMBL790604 | 0.62 | — | — | |
| SCHEMBL9206532 | 0.62 | — | — | |
| SCHEMBL15064143 | 0.58 | — | — | |
| SCHEMBL15064052 | 0.58 | — | — | |
| SCHEMBL10775400 | 0.58 | — | — | |
| SCHEMBL7371462 | 0.58 | — | — | |
| SCHEMBL6280458 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0750230-B1 | Negative type photosensitive compositions | FUJI PHOTO FILM CO LTD (JP) | 1999-02-10 | — | — | EP | disclosed |
| US-5725994-A | CONTAINING AN ACID PRECURSOR AND A HYDROXYL GROUP CONTAINING LINEAR POLYMER | FUJI PHOTO FILM CO., LTD. (JP) | 1998-03-10 | — | — | US | disclosed |
| EP-0750230-A2 | Negative type photosensitive compositions | FUJI PHOTO FILM CO., LTD. (JP) | 1996-12-27 | — | — | EP | disclosed |
| US-4399210-A | O-NAPHTHOQUINONEDIAZIDE AND A DISCOLORING AGENT | FUJI PHOTO FILM COMPANY LTD. (JP) | 1983-08-16 | — | — | US | disclosed |
| US-4000114-A | ADDUCT OF HEXAHALOCYCLOPENTADIENE, DECABROMODIPHENYL OXIDE, THERMOPLASTIC RESINS | HOOKER CHEMICALS & PLASTICS CORPORATION (US) | 1976-12-28 | — | — | US | disclosed |