SCHEMBL8382249

SCHEMBL8382249

CCCCCCCCCCCC[SiH2][SiH2][SiH3]

nearest known ligand 0.44

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.44
THRB P10828 1/20 0.44
DNM1 Q05193 6/20 0.41
CES2 O00748 3/20 0.36
CES1 P23141 3/20 0.36
HSP90AA1 P07900 1/20 0.36
ALDH1A1 P00352 2/20 0.35
LMNA P02545 2/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
HSD17B10 Q99714 1/20 0.35
SLC22A1 O15245 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5574208 1.00 TSHR (0.44) TSHRTHRBDNM1CES2CES1
SCHEMBL8383797 1.00 TSHR (0.44) TSHRTHRBDNM1CES2CES1
SCHEMBL18493443 1.00 TSHR (0.44) TSHRTHRBDNM1CES2CES1
SCHEMBL8381605 1.00 TSHR (0.44) TSHRTHRBDNM1CES2CES1
SCHEMBL8381642 1.00 TSHR (0.44) TSHRTHRBDNM1CES2CES1
SCHEMBL8386030 1.00 TSHR (0.44) TSHRTHRBDNM1CES2CES1
SCHEMBL8380488 1.00
SCHEMBL8385929 0.88
SCHEMBL21831902 0.87 TSHR (0.32) TSHRTHRBDNM1
SCHEMBL31164310 0.82 TSHR (0.38) TSHRTHRBDNM1CES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117766596-A PID effect-resistant photovoltaic module and preparation method thereof 苏州浩纳新材料科技有限公司 2024-03-26 CN claimed
CN-112457773-A Anti-dazzle nano coating and preparation method and application method thereof 苏州浩纳新材料科技有限公司 2021-03-09 CN claimed
CN-119836014-A Photovoltaic glass, preparation method thereof and photovoltaic module 深圳市华宝新能源股份有限公司 2025-04-15 CN disclosed
CN-117766596-A PID effect-resistant photovoltaic module and preparation method thereof 苏州浩纳新材料科技有限公司 2024-03-26 CN disclosed
CN-112457773-B Anti-dazzle nano coating and preparation method and application method thereof 苏州浩纳新材料科技有限公司 2022-04-12 CN disclosed
EP-0630933-B1 A method of producing a semiconducting material NIPPON OIL CO LTD (JP) 1999-04-14 EP disclosed
US-5700400-A Method for producing a semiconducting material NIPPON OIL CO., LTD. (JP) 1997-12-23 US disclosed
EP-0551771-B1 Process for producing polysilanes NIPPON OIL CO LTD (JP) 1997-07-30 EP disclosed
US-5620531-A Photovoltaic element NIPPON OIL CO., LTD. (JP) 1997-04-15 US disclosed
EP-0717451-A2 Photovoltaic element NIPPON OIL CO., LTD. (JP) 1996-06-19 EP disclosed
EP-0630933-A2 A method of producing a semiconducting material NIPPON OIL CO. LTD. (JP) 1994-12-28 EP disclosed
US-5304622-A Process for producing polysilanes NIPPON OIL COMPANY, LTD. (JP) 1994-04-19 US disclosed
EP-0551771-A2 Process for producing polysilanes NIPPON OIL CO. LTD. (JP) 1993-07-21 EP disclosed