SCHEMBL838359

SCHEMBL838359

SC1CC[CH]CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8950484 0.87
SCHEMBL8950611 0.85
SCHEMBL8950438 0.85
SCHEMBL5247542 0.81
SCHEMBL8950344 0.79
SCHEMBL8950483 0.79
SCHEMBL8745438 0.79
SCHEMBL8731330 0.77
SCHEMBL15848058 0.74
SCHEMBL11826494 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 100 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117983302-A Catalyst containing ferrocene PNP ligand for ethylene selective tetramerization and preparation method and application thereof 华东理工大学 2024-05-07 CN claimed
CN-117983302-A Catalyst containing ferrocene PNP ligand for ethylene selective tetramerization and preparation method and application thereof 华东理工大学 2024-05-07 CN disclosed
CN-115397891-B Polysiloxanes with radiation-crosslinkable and moisture-crosslinkable groups 瓦克化学股份公司 2024-02-02 CN disclosed
US-20230167246-A1 Polysiloxanes with radiation- and moisture-cross-linkable groups WACKER CHEMIE AG (DE) 2023-06-01 US disclosed
CN-115397891-A Polysiloxanes with radiation-crosslinkable and moisture-crosslinkable groups 瓦克化学股份公司 2022-11-25 CN disclosed
CN-110520007-B Outsole and shoe 株式会社爱世克私 2021-07-16 CN disclosed
US-11021433-B2 (Meth)acrylate compound, polymer, resist material, and method for producing (meth)acrylate compound JNC CORPORATION (JP) 2021-06-01 US disclosed
US-20200223782-A1 (METH)ACRYLATE COMPOUND, POLYMER, RESIST MATERIAL, AND METHOD FOR PRODUCING (METH)ACRYLATE COMPOUND JNC CORPORATION (JP) 2020-07-16 US disclosed
CN-111377818-A (meth) acrylate compound, polymer, resist material, and method for producing (meth) acrylate compound 捷恩智株式会社 2020-07-07 CN disclosed
EP-2725422-B1 PHOTOSENSITIVE COMPOSITION, MASTER PLATE FOR PLANOGRAPHIC PRINTING PLATE AND POLYURETHANE FUJIFILM CORP (JP) 2017-10-04 EP disclosed
US-5484871-A WATER CROSSLINKABLE WACKER-CHEMIE GMBH (DE) 1996-01-16 US disclosed
US-5420222-A Curable organo(poly)siloxane compositions WACKER-CHEMIE GMBH (DE) 1995-05-30 US disclosed
US-5397821-A Light and heat stabilizers, low volatility ELFATOCHEM NORTH AMERICA, INC. (US) 1995-03-14 US disclosed
US-5338853-A N-(2,2,6,6-tetraalkyl-4-piperidinyl)amic acid hydrazides; contain light stabilizing group and heat stabilizing group ELF ATOCHEM NORTH AMERICA, INC. (US) 1994-08-16 US disclosed
EP-0434080-A1 Derivatives of N-hals-substituted amic acid hydrazides ELF ATOCHEM NORTH AMERICA, INC. (US) 1991-06-26 EP disclosed
EP-0161219-B1 HETEROCYCLIC MERCAPTOCARBOXYLIC-ACID ESTERS AND ANHYDRIDES AS CORROSION INHIBITING AGENTS CIBA-GEIGY AG (CH) 1991-06-12 EP disclosed
EP-0161222-B1 HETEROCYCLIC MERCAPTOCARBOXYLIC-ACID AMIDES, IMIDES AND NITRILES AS CORROSION INHIBITING AGENTS CIBA-GEIGY AG (CH) 1990-10-10 EP disclosed
US-4719036-A PAINTS; METAL WORKING CIBA-GEIGY CORPORATION (US) 1988-01-12 US disclosed
EP-0161219-A2 Heterocyclic mercaptocarboxylic-acid esters and anhydrides as corrosion inhibiting agents CIBA-GEIGY AG (CH) 1985-11-13 EP disclosed
EP-0161222-A2 Heterocyclic mercaptocarboxylic-acid amides, imides and nitriles as corrosion inhibiting agents CIBA-GEIGY AG (CH) 1985-11-13 EP disclosed