SCHEMBL838880

SCHEMBL838880

CC(=NC(C)C)NC(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22172310 1.00
SCHEMBL2486989 1.00
SCHEMBL29931074 0.97
SCHEMBL30517357 0.97
SCHEMBL31602194 0.97
SCHEMBL31230191 0.97
SCHEMBL29833133 0.97
SCHEMBL17719306 0.74
SCHEMBL23512320 0.73
SCHEMBL13016430 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12398463-B1 Organic small molecule inhibitors and application method thereof in thin film deposition HEFEI ADCHEM SEMI-TECH. CO., LTD. (CN) 2025-08-26 US claimed
CN-117096019-A Methods and systems for forming memory devices and components thereof ASM IP私人控股有限公司 2023-11-21 CN claimed
CN-116924939-A Preparation method of magnesium complex 苏州源展材料科技有限公司 2023-10-24 CN claimed
CN-106336422-B Lanthanum compound, method for synthesizing lanthanum compound, lanthanum precursor composition, method for forming thin film, and method for manufacturing integrated circuit device 三星电子株式会社 2021-03-09 CN claimed
US-9773683-B2 Atomic layer or cyclic plasma etching chemistries and processes AMERICAN AIR LIQUIDE, INC. (US) 2017-09-26 US claimed
US-20150270140-A1 ATOMIC LAYER OR CYCLIC PLASMA ETCHING CHEMISTRIES AND PROCESSES AMERICAN AIR LIQUIDE, INC. 2015-09-24 US claimed
JP-8067686-A None JP disclosed
US-12398463-B1 Organic small molecule inhibitors and application method thereof in thin film deposition HEFEI ADCHEM SEMI-TECH. CO., LTD. (CN) 2025-08-26 US disclosed
CN-119913479-A Vapor deposition process for forming Magnesium Indium Zinc Oxide (MIZO) layer ASM IP私人控股有限公司 2025-05-02 CN disclosed
WO-2024240187-A9 DEVICE, PREPARATION METHOD, AND ELECTRONIC DEVICE 华为技术有限公司 2025-03-20 WO disclosed
CN-118291951-B Organic small molecule inhibitor and application method thereof in thin film deposition 合肥安德科铭半导体科技有限公司 2025-02-25 CN disclosed
WO-2024240187-A1 DEVICE, PREPARATION METHOD, AND ELECTRONIC DEVICE 华为技术有限公司 2024-11-28 WO disclosed
CN-118878563-A Preparation method of lanthanum complex 苏州源展材料科技有限公司 2024-11-01 CN disclosed
US-20040011252-A1 Non-toxic corrosion-protection pigments based on manganese UNIVERSITY OF DAYTON 2004-01-22 US disclosed
US-20030234063-A1 Non-toxic corrosion-protection conversion coats based on cobalt DAYTON, UNIVERSITY OF 2003-12-25 US disclosed
US-20030230363-A1 Non-toxic corrosion-protection rinses and seals based on cobalt UNIVERSITY OF DAYTON 2003-12-18 US disclosed
WO-2003060192-A1 NON-TOXIC CORROSION-PROTECTION RINSES AND SEALS BASED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed
WO-2003060191-A2 NON-TOXIC CORROSION-PROTECTION CONVERSION COATINGES ABSED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed
WO-2003060019-A1 NON-TOXIC CORROSION PROTECTION PIGMENTS BASED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed
JP-H0867686-A PHOSPHORAMIDITE FOR SYNTHESIS OF POLYNUCLEOTIDE CHIRON CORP 1996-03-12 JP disclosed