⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Charcoal, Activated SCHEMBL10656528 | 0.71 | — | — | |
| Charcoal, Activated SCHEMBL1906222 | 0.71 | — | — | |
| Charcoal, Activated SCHEMBL284156 | 0.71 | — | — | |
| Charcoal, Activated SCHEMBL8062180 | 0.71 | — | — | |
| Charcoal, Activated SCHEMBL9309171 | 0.71 | — | — | |
| Charcoal, Activated SCHEMBL605577 | 0.71 | — | — | |
| Charcoal, Activated SCHEMBL4612388 | 0.71 | — | — | |
| Charcoal, Activated SCHEMBL5446189 | 0.71 | — | — | |
| Charcoal, Activated SCHEMBL63726 | 0.71 | — | — | |
| Hydrogen Sulfide SCHEMBL434423 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-63260015-A | — | — | None | — | — | JP | disclosed |
| JP-63260015-A | — | — | None | — | — | JP | disclosed |
| CN-114807851-A | Method for preparing silicon-carbon hydride film coating by magnetron sputtering technology | 王志博 | 2022-07-29 | — | — | CN | disclosed |
| CN-205920977-U | Silicon heterojunction solar cell and photovoltaic module with novel projecting pole | 新奥光伏能源有限公司 | 2017-02-01 | — | — | CN | disclosed |
| CN-1135635-C | Stabilized amorphous silicon and devices containing same | ��Ī��/����̫����˾ | 2004-01-21 | — | — | CN | disclosed |
| US-5985689-A | Method of fabricating photoelectric conversion device having at least one step-back layer | CANON KABUSHIKI KAISHA (JP) | 1999-11-16 | — | — | US | disclosed |
| CN-1144573-A | Stabilized amorphous silicon and devices containing same | AMOCO ENRON SOLAR (US) | 1997-03-05 | — | — | CN | disclosed |
| US-5453629-A | Photoelectric conversion device having at least one step-back layer | CANON KABUSHIKI KAISHA (JP) | 1995-09-26 | — | — | US | disclosed |
| JP-S63260015-A | MANUFACTURE OF AMORPHOUS SILICON/CARBON HYDRIDE FILM | ULVAC CORP | 1988-10-27 | — | — | JP | disclosed |
| JP-S63260015-A | MANUFACTURE OF AMORPHOUS SILICON/CARBON HYDRIDE FILM | ULVAC CORP | 1988-10-27 | — | — | JP | disclosed |