⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2323781 | 0.79 | — | — | |
| SCHEMBL2317706 | 0.77 | — | — | |
| SCHEMBL8422805 | 0.70 | — | — | |
| SCHEMBL8458318 | 0.63 | — | — | |
| Hydrochloric Acid SCHEMBL811855 | 0.61 | — | — | |
| Bromide SCHEMBL1539750 | 0.61 | — | — | |
| SCHEMBL5395957 | 0.61 | — | — | |
| Hydrochloric Acid SCHEMBL11041276 | 0.61 | — | — | |
| Iodide SCHEMBL1539762 | 0.61 | — | — | |
| SCHEMBL3458803 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0658560-B1 | Process for removing oxygen-containing impurities in organo-gallium or -indium compounds | SUMITOMO CHEMICAL CO (JP) | 1999-10-20 | — | — | EP | claimed |
| US-5455364-A | Process for removing an impurity in organometallic compound | SUMITOMO CHEMICAL COMPANY, LTD. (JP) | 1995-10-03 | — | — | US | claimed |
| EP-0658560-A1 | Process for removing impurities in organometallic compounds | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1995-06-21 | — | — | EP | claimed |
| US-4720560-A | Hybrid organometallic compounds, particularly for metal organic chemical vapor deposition | MORTON THIOKOL, INC. (US) | 1988-01-19 | — | — | US | claimed |
| EP-0658560-B1 | Process for removing oxygen-containing impurities in organo-gallium or -indium compounds | SUMITOMO CHEMICAL CO (JP) | 1999-10-20 | — | — | EP | disclosed |
| US-5455364-A | Process for removing an impurity in organometallic compound | SUMITOMO CHEMICAL COMPANY, LTD. (JP) | 1995-10-03 | — | — | US | disclosed |
| EP-0658560-A1 | Process for removing impurities in organometallic compounds | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1995-06-21 | — | — | EP | disclosed |