Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 5/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.48 |
| ▸ | LMNA | P02545 | 4/20 | 0.44 |
| ▸ | HTT | P42858 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.40 |
| ▸ | ELANE | P08246 | 2/20 | 0.40 |
| ▸ | PGR | P06401 | 1/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.40 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.40 |
| ▸ | PDE4A | P27815 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | HRH1 | P35367 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8776808 | 0.87 | MAPT (0.44) | MAPTMAPK1HSD17B10KDM4EALOX15 | |
| SCHEMBL1617918 | 0.81 | ELANE (0.55) | MAPTMAPK1HSD17B10KDM4EALOX15 | |
| SCHEMBL926997 | 0.79 | MAPT (0.42) | MAPTMAPK1HSD17B10KDM4EALOX15 | |
| SCHEMBL5702433 | 0.79 | HSD17B10 (0.43) | MAPTMAPK1HSD17B10KDM4ELMNA | |
| SCHEMBL7752008 | 0.78 | MAPT (0.41) | MAPTMAPK1HSD17B10KDM4EALOX15 | |
| SCHEMBL11057558 | 0.78 | MAPT (0.58) | MAPTMAPK1HSD17B10KDM4EALOX15 | |
| SCHEMBL929635 | 0.76 | MAPT (0.43) | MAPTMAPK1HSD17B10KDM4EALOX15 | |
| SCHEMBL8776805 | 0.76 | FNTA (0.39) | MAPTMAPK1HSD17B10KDM4EALOX15 | |
| SCHEMBL27456101 | 0.75 | KMT2A (0.41) | MAPTMAPK1HSD17B10KDM4ELMNA | |
| SCHEMBL926963 | 0.75 | MAPT (0.42) | MAPTMAPK1HSD17B10KDM4EALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5470996-A | Pattern forming material and process for forming pattern using the same | HITACHI, LTD. (JP) | 1995-11-28 | — | — | US | claimed |
| US-5118582-A | PATTERN FORMING MATERIAL AND PROCESS FOR FORMING PATTERN USING THE SAME | HITACHI, LTD. (JP) | 1992-06-02 | — | — | US | claimed |
| EP-0704762-B1 | Resist material and pattern formation | WAKO PURE CHEM IND LTD (JP) | 1999-12-15 | — | — | EP | disclosed |
| EP-0388813-B1 | Pattern forming material and process for forming pattern using the same | HITACHI LTD (JP) | 1997-12-10 | — | — | EP | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| US-5470996-A | Pattern forming material and process for forming pattern using the same | HITACHI, LTD. (JP) | 1995-11-28 | — | — | US | disclosed |
| EP-0510441-A1 | Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-10-28 | — | — | EP | disclosed |
| US-5118582-A | PATTERN FORMING MATERIAL AND PROCESS FOR FORMING PATTERN USING THE SAME | HITACHI, LTD. (JP) | 1992-06-02 | — | — | US | disclosed |
| EP-0388813-A2 | Pattern forming material and process for forming pattern using the same | HITACHI, LTD. (JP) | 1990-09-26 | — | — | EP | disclosed |