⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21728021 | 0.73 | — | — | |
| SCHEMBL26445543 | 0.73 | — | — | |
| SCHEMBL19140940 | 0.73 | — | — | |
| SCHEMBL19249346 | 0.73 | — | — | |
| SCHEMBL20712696 | 0.71 | — | — | |
| SCHEMBL1262013 | 0.69 | — | — | |
| SCHEMBL19117824 | 0.69 | — | — | |
| SCHEMBL24466314 | 0.66 | — | — | |
| SCHEMBL20081093 | 0.66 | EPHX1 (0.35) | — | |
| SCHEMBL13318697 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108369907-B | Liquid composition and method for surface treatment of semiconductor substrate using same | 三菱瓦斯化学株式会社 | 2022-09-20 | — | — | CN | claimed |
| US-11094526-B2 | Liquid composition for imparting alcohol-repellency to semiconductor substrate material, and method for treating surface of semiconductor substrate using said liquid composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-08-17 | — | — | US | claimed |
| EP-3404700-B1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-05-13 | — | — | EP | claimed |
| US-20190019672-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-01-17 | — | — | US | claimed |
| EP-3404700-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-11-21 | — | — | EP | claimed |
| CN-108369907-B | Liquid composition and method for surface treatment of semiconductor substrate using same | 三菱瓦斯化学株式会社 | 2022-09-20 | — | — | CN | disclosed |
| US-11094526-B2 | Liquid composition for imparting alcohol-repellency to semiconductor substrate material, and method for treating surface of semiconductor substrate using said liquid composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-08-17 | — | — | US | disclosed |
| EP-3404700-B1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-05-13 | — | — | EP | disclosed |
| US-20190019672-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-01-17 | — | — | US | disclosed |
| EP-3404700-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-11-21 | — | — | EP | disclosed |
| US-8131527-B1 | FGFR pharmacophore compounds | ASTEX THERAPEUTICS LTD. (GB) | 2012-03-06 | — | — | US | disclosed |