SCHEMBL850884

SCHEMBL850884

CCC(CC)(CC(=O)OCC(F)(F)F)OC(=O)C(CC(C)(C)C)C(C)C

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL824288 0.79 HTT (0.37) HTT
SCHEMBL13180293 0.79 HTT (0.33) HTT
SCHEMBL13146647 0.78 HTT (0.48) HTT
SCHEMBL20668212 0.77 HTT (0.38) HTT
SCHEMBL19772644 0.75 HTT (0.36) HTT
SCHEMBL824343 0.75 HTT (0.34) HTT
SCHEMBL14548674 0.74 HTT (0.31) HTT
SCHEMBL15214080 0.73
SCHEMBL13262539 0.72 HTT (0.30) HTT
SCHEMBL13181072 0.71 HTT (0.35) HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142979-B2 Resist composition for immersion exposure and method of forming resist pattern using the same Tokyo Ohka Tokyo Co., Ltd. (JP) 2012-03-27 US disclosed
US-20090311627-A1 Resist composition for immersion exposure and method of forming resist pattern using the same TOKYO OHKA KOGYO CO., LTD. 2009-12-17 US disclosed