SCHEMBL8510472

SCHEMBL8510472

NC=CNC=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18602992 1.00
SCHEMBL11202100 0.76
SCHEMBL4381095 0.76
SCHEMBL14157891 0.76
SCHEMBL5252582 0.72
SCHEMBL9139959 0.72
SCHEMBL11639699 0.72
SCHEMBL129372 0.66
SCHEMBL14051269 0.65
SCHEMBL17066448 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5883068-A AMPHOTERIC OR ZWITTERION SURFACTANTS WITH ALKYL GLYCOSIDES, SULFOSUCCINATES HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 1999-03-16 US claimed
CN-108137845-A System and method for producing cast-in-place foam 巴斯夫欧洲公司 2018-06-08 CN disclosed
CN-107743533-A Purposes for the method for the material of network of the production with least two polymer, its product and the product 凯米罗总公司 2018-02-27 CN disclosed
CN-101842399-B Fluorine-containing copolymer, water and oil proofing composition, and method for producing same ASAHI GLASS CO LTD 2013-01-23 CN disclosed
CN-1735729-B Composition for surface treatment of substrates GE BAYER SILICONES GMBH & CO 2010-05-26 CN disclosed
CN-100523100-C Ink for inkjet printing, ink set for inkjet printing, inkjet recording material, method for producing inkjet recording material, and inkjet recording method FUJI PHOTO FILM CO LTD (JP) 2009-08-05 CN disclosed
CN-1860190-A Ink for inkjet printing, ink set for inkjet printing, inkjet recording material, method for producing inkjet recording material, and inkjet recording method FUJI PHOTO FILM CO LTD (JP) 2006-11-08 CN disclosed
CN-1735729-A Composition for surface treatment of substrates GE BAYER SILICONES GMBH & CO (DE) 2006-02-15 CN disclosed
CN-1620523-A Polymer derivatives for treating metals BASF AG (DE) 2005-05-25 CN disclosed
CN-1096851-C Adjuvant for a vaccine composition PASTEUR MERIEUX SERUMS VACC (FR) 2002-12-25 CN disclosed
US-5883068-A AMPHOTERIC OR ZWITTERION SURFACTANTS WITH ALKYL GLYCOSIDES, SULFOSUCCINATES HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 1999-03-16 US disclosed
CN-1168629-A Adjuvant for a vaccine composition PASTEUR MERIEUX SERUMS VACC (FR) 1997-12-24 CN disclosed