SCHEMBL8515895

SCHEMBL8515895

IC12CCC(CC1)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL108199 0.89
SCHEMBL9010415 0.87
SCHEMBL20956889 0.65 SLC22A2 (0.30)
SCHEMBL761698 0.65 GRIN2D (0.44)
SCHEMBL7570194 0.62
SCHEMBL1324526 0.61
SCHEMBL17969194 0.61
SCHEMBL155349 0.60
SCHEMBL9296018 0.60
SCHEMBL8646647 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11814380-B2 Benzylamino substituted pyridopyrimidinones and derivatives as SOS1 inhibitors BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) 2023-11-14 US disclosed
US-20230360922-A1 ROBUST ASHABLE HARD MASK LAM RESEARCH CORPORATION 2023-11-09 US disclosed
EP-2699553-B1 SUBSTITUTED DIAMINOCARBOXAMIDE AND DIAMINOCARBONITRILE PYRIMIDINES, COMPOSITIONS THEREOF, AND METHODS OF TREATMENT THEREWITH SIGNAL PHARM LLC (US) 2023-11-08 EP disclosed
EP-3018118-B1 BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2023-07-05 EP disclosed
CN-115735262-A Robust ashable hard mask 朗姆研究公司 2023-03-03 CN disclosed
WO-2022066927-A1 ROBUST ASHABLE HARD MASK LAM RESEARCH CORPORATION (US) 2022-03-31 WO disclosed
WO-2022048684-A1 JNK INHIBITOR, PHARMACEUTICAL COMPOSITION THEREOF AND USE THEREOF 武汉朗来科技发展有限公司 2022-03-10 WO disclosed
US-20210009588-A1 NOVEL BENZYLAMINO SUBSTITUTED PYRIDOPYRIMIDINONES AND DERIVATIVES AS SOS1 INHIBITORS BOEHRINGER INGELHEIM INT (DE) 2021-01-14 US disclosed
WO-2019034725-A1 INHIBITORS OF INDOLEAMINE 2,3-DIOXYGENASE AND/OR TRYPTOPHAN 2,3-DIOXYGENASE IDORSIA PHARMACEUTICALS LTD (CH) 2019-02-21 WO disclosed
CN-105339340-B Generated base alkaline agent, the alkali reactive composition containing the generated base alkaline agent and production alkali method 富士胶片和光纯药株式会社 2018-10-12 CN disclosed
CN-106414461-B Borate-based generated base alkaline agent and alkali reactive composition containing the generated base alkaline agent 富士胶片和光纯药株式会社 2018-09-11 CN disclosed
CN-107848963-A Alkali-producing agent and/or radical-generating agent having acid resistance, and curable resin composition containing same 和光纯药工业株式会社 2018-03-27 CN disclosed
CN-106414461-A BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR 和光纯药工业株式会社 2017-02-15 CN disclosed
CN-105339340-A Base generator, base-reactive composition containing said base generator, and base generation method WAKO PURE CHEM IND LTD 2016-02-17 CN disclosed
WO-2015086452-A1 METHOD FOR PRODUCING FORMALDEHYDE-ALKYL CARBONATE-COPOLYMERS BAYER MATERIALSCIENCE AG (DE) 2015-06-18 WO disclosed
EP-2649128-A2 POLYMER COMPOSITION FOR MICROELECTRONIC ASSEMBLY Promerus, LLC (US) 2013-10-16 EP disclosed
WO-2012071319-A2 POLYMER COMPOSITION FOR MICROELECTRONIC ASSEMBLY PROMERUS LLC (US) 2012-05-31 WO disclosed