SCHEMBL8520645

SCHEMBL8520645

CC(=CC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(F)(F)F)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2680481 1.00
SCHEMBL848224 1.00
SCHEMBL2804997 0.93
SCHEMBL30945869 0.89
SCHEMBL30540306 0.87
SCHEMBL7591376 0.85
SCHEMBL14861335 0.83
SCHEMBL1581276 0.83
SCHEMBL3384336 0.83
SCHEMBL7048723 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5998084-A RADIATION-SENSITIVE 1,2-NAPHTHOQUINONE-2-DIAZIDE-4- OR -5-SULFONIC ACID ESTER OF A POLYCONDENSATE HAVING PHENOLIC HYDROXY GROUPS; NOVOLAK; VINYL POLYMER COMPRISING AT LEAST ONE UNIT HAVING A LATERAL HYDROXYPHENYL GROUP, CLATHRATE AGFA-GEVAERT N.V. (BE) 1999-12-07 US disclosed
EP-0774692-B1 Radiation-sensitive recording material for the production of planographic printing plates AGFA GEVAERT AG (DE) 1999-09-29 EP disclosed
EP-0774692-A2 Radiation-sensitive recording material for the production of planographic printing plates HOECHST AKTIENGESELLSCHAFT (DE) 1997-05-21 EP disclosed