SCHEMBL852287

SCHEMBL852287

FC(F)(F)CC[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL28106397 0.96
SCHEMBL5665470 0.78
SCHEMBL1051829 0.77
SCHEMBL13748172 0.74
SCHEMBL23530116 0.72
SCHEMBL20357713 0.72
SCHEMBL166134 0.71
SCHEMBL30548959 0.71
SCHEMBL10501066 0.69
SCHEMBL19611506 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 520 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260011722-A1 Production Process for a Porous Host Structure Containing Silicon Oxide as an Anode Active Material for a Lithium Battery HONEYCOMB BATTERY COMPANY (US) 2026-01-08 US claimed
US-20250300172-A1 Process for Producing Porous Host Structure Containing Silicon as an Anode Active Material for a Lithium Battery HONEYCOMB BATTERY COMPANY (US) 2025-09-25 US claimed
US-20230420256-A1 METHOD OF FORMING A PHOTORESIST UNDERLAYER AND STRUCTURE INCLUDING SAME ASM IP HOLDING B.V. (NL) 2023-12-28 US claimed
WO-2023178880-A1 SPRAYING-FREE COMPOSITE MATERIAL FOR PREVENTING HEAVY METAL POLLUTION, AND PREPARATION METHOD THEREFOR 江苏新日电动车股份有限公司 2023-09-28 WO claimed
US-11735422-B2 Method of forming a photoresist underlayer and structure including same ASM IP HOLDING B.V. (NL) 2023-08-22 US claimed
US-20230207309-A1 METHOD AND APPARATUS FOR FILLING A GAP ASM IP HOLDING B.V. (NL) 2023-06-29 US claimed
US-11610775-B2 Method and apparatus for filling a gap ASM IP HOLDING B.V. (NL) 2023-03-21 US claimed
CN-115627302-A Self-masking zirconium-based halide perovskite nano tanning agent and preparation method thereof 陕西科技大学 2023-01-20 CN claimed
CN-110072694-B Liquid and viscoelastic repellent and anti-biofouling coatings 宾夕法尼亚州立大学研究基金会 2023-01-17 CN claimed
CN-112952199-B Electrolyte and lithium ion battery comprising same 远景动力技术(江苏)有限公司 2022-08-23 CN claimed
WO-2016146896-A1 NOVEL SILOXANE POLYMER COMPOSITIONS AND THEIR USE OPTITUNE OY (FI) 2016-09-22 WO claimed
US-8926745-B2 Method for preparing low K material and film thereof NANMAT TECHNOLOGY CO., LTD. (TW) 2015-01-06 US claimed
CN-103975237-A Multimodal platform for compound detection UNIV UTAH RES FOUND 2014-08-06 CN claimed
CN-101889030-B Metallocene compound, catalyst containing the same, and process for producing olefin polymer using the catalyst LUMMUS NOVOLEN TECHNOLOGY GMBH (DE) 2013-07-17 CN claimed
CN-101820739-B Method of manufacturing an electromagnetic wave shield for a plasma display panel and display panel for plasma display device SAMSUNG SDI CO LTD 2013-02-20 CN claimed
EP-2011834-B1 CURABLE COMPOSITION KANEKA CORP (JP) 2012-07-25 EP claimed
US-20120118204-A1 METHOD FOR PREPARING LOW K MATERIAL AND FILM THEREOF NANMAT TECHNOLOGY CO., LTD. (TW) 2012-05-17 US claimed
US-7943084-B1 Metal powders with improved flowability THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) 2011-05-17 US claimed
US-6574497-B1 MRI medical device markers utilizing fluorine-19 ADVANCED CARDIOVASCULAR SYSTEMS, INC. 2003-06-03 US claimed
US-4234441-A Silicone oil compositions containing silicate cluster compounds OLIN CORPORATION (US) 1980-11-18 US claimed