⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3057955 | 0.96 | — | — | |
| SCHEMBL5072476 | 0.96 | — | — | |
| SCHEMBL8573279 | 0.96 | — | — | |
| SCHEMBL5070120 | 0.92 | — | — | |
| SCHEMBL331119 | 0.92 | — | — | |
| SCHEMBL2542588 | 0.90 | — | — | |
| SCHEMBL3182851 | 0.90 | — | — | |
| SCHEMBL12298295 | 0.89 | — | — | |
| SCHEMBL5072534 | 0.89 | — | — | |
| SCHEMBL5074392 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115176201-A | Positive photosensitive resin composition | ＡＧＣ株式会社 | 2022-10-11 | — | — | CN | disclosed |
| US-20210191264-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND ORGANIC EL DISPLAY AND MANUFACTURING METHOD THEREFOR | TORAY INDUSTRIES, INC. (JP) | 2021-06-24 | — | — | US | disclosed |
| CN-108504078-A | A kind of composition and its preparation method and application | 科思创聚合物（中国）有限公司 | 2018-09-07 | — | — | CN | disclosed |
| EP-2596040-A1 | POLYURETHANE HAVING LOW VOLUME SHRINKAGE | Bayer Intellectual Property GmbH (DE) | 2013-05-29 | — | — | EP | disclosed |
| WO-2012010524-A1 | POLYURETHANE HAVING LOW VOLUME SHRINKAGE | BAYER MATERIALSCIENCE AG (DE) | 2012-01-26 | — | — | WO | disclosed |
| US-7501542-B2 | Highly-packed polycationic ammonium, sulfonium and phosphonium lipids | INVITROGEN CORPORATION (US) | 2009-03-10 | — | — | US | disclosed |
| US-5767212-A | RADICALLY POLYMERIZING ACRYLATE MONOMER CONTAINING SULFUR | TORAY INDUSTRIES, INC. (JP) | 1998-06-16 | — | — | US | disclosed |
| EP-0609454-B1 | PROCESS FOR PRODUCING CLEAR SULFUR-CONTAINING POLYMER | TORAY INDUSTRIES (JP) | 1997-10-22 | — | — | EP | disclosed |
| EP-0609454-A1 | PROCESS FOR PRODUCING CLEAR SULFUR-CONTAINING POLYMER | TORAY INDUSTRIES, INC. (JP) | 1994-08-10 | — | — | EP | disclosed |