SCHEMBL8613697

SCHEMBL8613697

[CH2]CCCSO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11254244 0.76
SCHEMBL8762931 0.72
SCHEMBL1796278 0.69
SCHEMBL7816546 0.67
SCHEMBL4261229 0.67
SCHEMBL16450750 0.67
SCHEMBL8486066 0.66
SCHEMBL17058262 0.64
SCHEMBL4937018 0.64
SCHEMBL5812637 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0518352-B1 Process for forming super high-contrast negative images and silver halide photographic material and developer being used therefor DAINIPPON INK & CHEMICALS (JP) 1998-04-22 EP disclosed
US-5460919-A Process of forming super high-contrast negative images and silver halide photographic material and developer being used therefor DAINIPPON INK AND CHEMICALS, INC. (JP) 1995-10-24 US disclosed
US-5372911-A Support having one or more hydrophilic colloidal layers, at least one layer contains pyridinium salt or derivative, quinolinium salt or derivative, or isoquinolinium salt or derivative DAINIPPON INK AND CHEMICALS, INC. (JP) 1994-12-13 US disclosed
EP-0518352-A1 Process for forming super high-contrast negative images and silver halide photographic material and developer being used therefor DAINIPPON INK AND CHEMICALS, INC. (JP) 1992-12-16 EP disclosed