⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1286407 | 0.73 | — | — | |
| SCHEMBL890319 | 0.71 | — | — | |
| SCHEMBL9284628 | 0.67 | — | — | |
| SCHEMBL68490 | 0.67 | — | — | |
| SCHEMBL8590450 | 0.66 | — | — | |
| SCHEMBL170292 | 0.65 | — | — | |
| SCHEMBL1513648 | 0.59 | — | — | |
| SCHEMBL6293076 | 0.59 | — | — | |
| SCHEMBL250606 | 0.59 | — | — | |
| SCHEMBL3762765 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2017368-B1 | Precursor Compositions And Methods | ROHM & HAAS ELECT MAT (US) | 2019-10-16 | — | — | EP | claimed |
| EP-2000561-B1 | Organometallic compounds | ROHM & HAAS ELECT MAT (US) | 2013-12-11 | — | — | EP | claimed |
| US-8142847-B2 | Precursor compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-03-27 | — | — | US | claimed |
| US-20110287184-A1 | PRECURSOR COMPOSITIONS AND METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-11-24 | — | — | US | claimed |
| US-8012536-B2 | Method of forming metal-containing layer using organometallic compounds | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-09-06 | — | — | US | claimed |
| EP-2017368-A2 | Precursor Compositions And Methods | Rohm and Haas Electronic Materials LLC (US) | 2009-01-21 | — | — | EP | claimed |
| US-20090017208-A1 | Precursor compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-01-15 | — | — | US | claimed |
| US-20080305260-A1 | Organometallic compounds | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-12-11 | — | — | US | claimed |
| EP-2000561-A1 | Organometallic compounds | Rohm and Haas Electronic Materials, L.L.C. (US) | 2008-12-10 | — | — | EP | claimed |
| US-11807652-B2 | Tungsten compound, raw material for thin film formation and method for producing thin film | ADEKA CORPORATION (JP) | 2023-11-07 | — | — | US | disclosed |
| US-11618762-B2 | Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound | ADEKA CORPORATION (JP) | 2023-04-04 | — | — | US | disclosed |
| US-20220017554-A1 | COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR MANUFACTURING THIN FILM, AND AMIDINE COMPOUND | ADEKA CORPORATION (JP) | 2022-01-20 | — | — | US | disclosed |
| US-11161867-B2 | Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound | ADEKA CORPORATION (JP) | 2021-11-02 | — | — | US | disclosed |
| US-20210193508-A1 | METHOD OF FORMING MATERIAL FILM, INTEGRATED CIRCUIT DEVICE, AND METHOD OF MANUFACTURING THE INTEGRATED CIRCUIT DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-06-24 | — | — | US | disclosed |
| US-5679765-A | Polyether having heterofunctional groups at both ends, process for the preparation thereof and polymerization initiator therefor | RESEARCH DEVELOPMENT CORPORATION OF JAPAN (JP) | 1997-10-21 | — | — | US | disclosed |
| US-5483008-A | Polyether having heterofunctional groups at both ends, process for the preparation thereof and polymerization initiator therefor | RESEARCH DEVELOPMENT CORPORATION OF JAPAN (JP) | 1996-01-09 | — | — | US | disclosed |
| EP-0555101-A2 | Polyether having heterofunctional groups at both ends, process for the preparation thereof and polymerization initiator therefor | RESEARCH DEVELOPMENT CORPORATION OF JAPAN (JP) | 1993-08-11 | — | — | EP | disclosed |
| EP-0267698-B1 | CURING COMPOSITION | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1993-06-23 | — | — | EP | disclosed |
| US-4785035-A | SILYL GROUP CONTAINING ACRYLATE AND ISOCYANATE OLIGOMER | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1988-11-15 | — | — | US | disclosed |
| EP-0267698-A2 | Curing composition | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1988-05-18 | — | — | EP | disclosed |