SCHEMBL861656

SCHEMBL861656

C=CCC=C=N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2397890 0.73
SCHEMBL4665460 0.69
SCHEMBL487549 0.69
SCHEMBL6163877 0.67
SCHEMBL834004 0.67
SCHEMBL4244695 0.67
SCHEMBL7456365 0.67
SCHEMBL834003 0.67
SCHEMBL11208542 0.67
SCHEMBL3802013 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107663044-B Geopolymer type soft soil cementing agent and preparation method thereof 武汉二航路桥特种工程有限责任公司 2020-04-17 CN claimed
US-4139499-A Thermally reversible amphoteric ion exchange resins of improved demineralization capacity ICI AUSTRALIA LIMITED (AU) 1979-02-13 US claimed
US-4134815-A Amphoteric composite resins and method of preparing same by polymerization of a two-phase dispersion of monomers ICI AUSTRALIA LIMITED (AU) 1979-01-16 US claimed
CN-107663044-B Geopolymer type soft soil cementing agent and preparation method thereof 武汉二航路桥特种工程有限责任公司 2020-04-17 CN disclosed
US-20150064552-A1 COMPOSITE ANODE MATERIAL FOR A LITHIUM ION BATTERY AND PREPARATION METHOD THEREOF DONGGUAN AMPEREX TECHNOLOGY LIMITED (CN) 2015-03-05 US disclosed
EP-1865093-B1 Copper electroplating liquid, pretreatment liquid for copper electroplating and method of copper electroplating JX NIPPON MINING & METALS CORP (JP) 2012-03-28 EP disclosed
EP-1249517-B1 METHOD OF COPPER ELECTROPLATING with pretreatment NIPPON MINING CO (JP) 2011-01-12 EP disclosed
EP-1865093-A1 Copper electroplating liquid, pretreatment liquid for copper electroplating and method of copper electroplating Nippon Mining & Metals Co., Ltd. (JP) 2007-12-12 EP disclosed
WO-2006077162-A1 USE OF ANTI-MICROBIAL POLYMERS AS EMULSIFIERS AND ANTI-MICROBIAL POLYMER DISPERSIONS CONTAINING EMULSIFIERS ALBERT-LUDWIGS-UNIVERSITÄT FREIBURG (DE) 2006-07-27 WO disclosed
US-6562222-B1 Copper sulfate, sulfuric acid, chlorine, silane coupling agent; semiconductors NIKKO MATERIALS COMPANY, LIMITED (JP) 2003-05-13 US disclosed
EP-1249517-A1 COPPER ELECTROPLATING LIQUID, PRETREATMENT LIQUID FOR COPPER ELECTROPLATING AND METHOD OF COPPER ELECTROPLATING Nikko Materials Company, Limited (JP) 2002-10-16 EP disclosed