SCHEMBL8618074

SCHEMBL8618074

FC(F)C(F)O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29222409 0.77
SCHEMBL702308 0.67
SCHEMBL459885 0.64
SCHEMBL9935544 0.64
SCHEMBL17763393 0.62
SCHEMBL9150555 0.61
SCHEMBL6271246 0.61
SCHEMBL712152 0.58
SCHEMBL798351 0.58
SCHEMBL7858124 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-219922301-U Filtration collection device is used in preparation of vinyl tris (trifluoroethoxy) silane 汶上华辰新材料有限公司 2023-10-31 CN claimed
US-5177131-A Polysilethylenesiloxane, hydrolyzable silane compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 1993-01-05 US claimed
CN-118136957-A Local high-concentration electrolyte using fluorinated silyl ether diluent 湖南科技大学 2024-06-04 CN disclosed
CN-115160358-B Method for producing vinyl triethoxysilane by supergravity method 浙江锦华新材料股份有限公司 2024-04-12 CN disclosed
CN-219922301-U Filtration collection device is used in preparation of vinyl tris (trifluoroethoxy) silane 汶上华辰新材料有限公司 2023-10-31 CN disclosed
CN-219922301-U Filtration collection device is used in preparation of vinyl tris (trifluoroethoxy) silane 汶上华辰新材料有限公司 2023-10-31 CN disclosed
CN-116947903-A Inhibitors of complement factors and uses thereof 安尼艾克松股份有限公司 2023-10-27 CN disclosed
CN-116261564-A Inhibitors of complement factors and uses thereof 安尼艾克松股份有限公司 2023-06-13 CN disclosed
CN-115160358-A Method for producing vinyltriethoxysilane by supergravity method 浙江锦华新材料股份有限公司 2022-10-11 CN disclosed
CN-107428891-B Curable composition 施敏打硬株式会社 2021-04-20 CN disclosed
CN-105392845-B Photocurable composition 思美定株式会社 2020-10-20 CN disclosed
EP-3081612-A1 PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES Cemedine Co., Ltd. (JP) 2016-10-19 EP disclosed
US-20160152783-A1 PHOTOCURABLE COMPOSITION CEMEDINE CO., LTD. (JP) 2016-06-02 US disclosed
EP-3023462-A1 PHOTOCURABLE COMPOSITION Cemedine Co., Ltd. (JP) 2016-05-25 EP disclosed
EP-0837901-A1 FLUOROPOLYMER NANOCOMPOSITES E.I. DU PONT DE NEMOURS AND COMPANY (US) 1998-04-29 EP disclosed
EP-0468663-B1 Room temperature curing composition SHINETSU CHEMICAL CO (JP) 1997-09-17 EP disclosed
WO-1997001599-A1 FLUOROPOLYMER NANOCOMPOSITES E.I. DU PONT DE NEMOURS AND COMPANY (US) 1997-01-16 WO disclosed
US-5326816-A Sealants, coatings, soil release, polymer with repeating disiloxane group SHIN-ETSU CHEMICAL CO., LTD. (JP) 1994-07-05 US disclosed
US-5177131-A Polysilethylenesiloxane, hydrolyzable silane compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 1993-01-05 US disclosed
EP-0468663-A2 Room temperature curing composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 1992-01-29 EP disclosed