SCHEMBL8618832

SCHEMBL8618832

O=C1OCC2C=CCC=C12

nearest known ligand 0.30

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 1/20 0.30
CHRNB4 P30926 1/20 0.30
CHRNA3 P32297 1/20 0.30
CHRNA7 P36544 1/20 0.30
CHRNA4 P43681 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11753866 0.64
SCHEMBL662813 0.60 MAPT (0.40) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL7508698 0.58
SCHEMBL9900722 0.55
SCHEMBL2502107 0.55
SCHEMBL2319141 0.54 BACE1 (0.32)
SCHEMBL8857064 0.53 CYP19A1 (0.30)
SCHEMBL6536235 0.51
SCHEMBL2449069 0.50
SCHEMBL8750616 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5721076-A A PHOTO OR THERMAL CURABLE, ALKALI-DEVELOPABLE PHOTOSENSITIVE POLYESTER MONOMERS CONTAINING ACRYLATED BISPHENOL EPOXY COMPOUNDS AND MONOANHYDIDE OR DIANHYDRIDE COMPOUNDS; NIPPON STEEL CORPORATION (JP) 1998-02-24 US disclosed