SCHEMBL8626318

SCHEMBL8626318

C=C(C)[C]1OC1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13785021 0.73
SCHEMBL9748832 0.64
Maleic Anhydride SCHEMBL28247 0.61 KMT2A (0.32)
Maleic Anhydride SCHEMBL419946 0.61 KMT2A (0.32)
Maleic Anhydride SCHEMBL11037404 0.59 KMT2A (0.31)
SCHEMBL8625019 0.55
SCHEMBL10864224 0.55
SCHEMBL35000 0.53
Formaldehyde SCHEMBL9668874 0.53
Oxygen SCHEMBL28300393 0.53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5851712-A Electrophotosensitive material MITA INDUSTRIAL CO., LTD. (JP) 1998-12-22 US disclosed
EP-0552740-B1 Electrophotosensitive material MITA INDUSTRIAL CO LTD (JP) 1998-07-29 EP disclosed
EP-0801331-A2 Electrophotosensitive material MITA INDUSTRIAL CO. LTD. (JP) 1997-10-15 EP disclosed
US-5521044-A SENSITIVITY, DURABILITY MITA INDUSTRIAL CO., LTD. (JP) 1996-05-28 US disclosed
EP-0552740-A1 Electrophotosensitive material MITA INDUSTRIAL CO. LTD. (JP) 1993-07-28 EP disclosed