⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5397020 | 1.00 | — | — | |
| SCHEMBL14191848 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL22771664 | 0.97 | — | — | |
| Hydrochloric Acid SCHEMBL22575292 | 0.97 | — | — | |
| SCHEMBL5403673 | 0.94 | — | — | |
| SCHEMBL15901915 | 0.84 | KCNH2 (0.37) | — | |
| SCHEMBL2977598 | 0.83 | KCNH2 (0.35) | — | |
| SCHEMBL431523 | 0.83 | TSHR (0.33) | — | |
| SCHEMBL283619 | 0.83 | TSHR (0.33) | — | |
| SCHEMBL2977599 | 0.83 | KCNH2 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11094526-B2 | Liquid composition for imparting alcohol-repellency to semiconductor substrate material, and method for treating surface of semiconductor substrate using said liquid composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-08-17 | — | — | US | claimed |
| EP-3404700-B1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-05-13 | — | — | EP | claimed |
| US-20190019672-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-01-17 | — | — | US | claimed |
| EP-3404700-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-11-21 | — | — | EP | claimed |
| US-11094526-B2 | Liquid composition for imparting alcohol-repellency to semiconductor substrate material, and method for treating surface of semiconductor substrate using said liquid composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-08-17 | — | — | US | disclosed |
| EP-3404700-B1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-05-13 | — | — | EP | disclosed |
| US-20190019672-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-01-17 | — | — | US | disclosed |
| EP-3404700-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-11-21 | — | — | EP | disclosed |
| WO-2017038838-A1 | NOVEL PYRAZOLO[3,4-d]PYRIMIDINE COMPOUND OR SALT THEREOF | 大鵬薬品工業株式会社 | 2017-03-09 | — | — | WO | disclosed |
| WO-2016121953-A1 | PROPHYLACTIC AND/OR THERAPEUTIC AGENT FOR IMMUNE DISEASES | 大鵬薬品工業株式会社 | 2016-08-04 | — | — | WO | disclosed |
| CN-103764683-B | The manufacture method of modified conjugated diene polymer, modified conjugated diene polymer, modified conjugated diene polymer composition, rubber combination and tire | ASAHI KASEI CHEMICALS CORP. (JP) | 2016-01-20 | — | — | CN | disclosed |
| WO-2015022926-A1 | NOVEL FUSED PYRIMIDINE COMPOUND OR SALT THEREOF | 大鵬薬品工業株式会社 (JP) | 2015-02-19 | — | — | WO | disclosed |
| CN-103764683-A | Method for producing modified conjugated diene polymer, modified conjugated diene polymer, modified conjugated diene polymer composition, rubber composition, and tire | ASAHI KASEI CHEMICALS CORP | 2014-04-30 | — | — | CN | disclosed |
| US-5756846-A | CATALYTIC TELOMERIZATION WITH BUTADIENE AND AMMONIA | BAYER AKTIENGESELLSCHAFT (DE) | 1998-05-26 | — | — | US | disclosed |
| EP-0190352-B1 | ALKALI METAL-CARRYING SUBSTANCE, AND ITS USE AS CATALYST | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1989-10-11 | — | — | EP | disclosed |
| US-4675307-A | HYDROTALCITE | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1987-06-23 | — | — | US | disclosed |
| EP-0190352-A1 | ALKALI METAL-CARRYING SUBSTANCE, AND ITS USE AS CATALYST | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1986-08-13 | — | — | EP | disclosed |
| US-4260750-A | OF DIENES, TRIARYLPHOSPHINE CATALYST | RHONE-POULENC INDUSTRIES (FR) | 1981-04-07 | — | — | US | disclosed |
| US-4219677-A | FOR DIENES IN PRESENCE OF SULFONATED PHOSPHINE CATALYST | RHONE-POULENC INDUSTRIES (FR) | 1980-08-26 | — | — | US | disclosed |
| US-4142060-A | DIENES, WATER | RHONE-POULENC INDUSTRIES (FR) | 1979-02-27 | — | — | US | disclosed |