⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20138385 | 1.00 | — | — | |
| SCHEMBL150399 | 0.61 | — | — | |
| SCHEMBL181215 | 0.61 | — | — | |
| SCHEMBL269550 | 0.58 | — | — | |
| Hydrochloric Acid SCHEMBL20534374 | 0.58 | — | — | |
| SCHEMBL5420857 | 0.58 | — | — | |
| Fluoride SCHEMBL20534438 | 0.58 | — | — | |
| SCHEMBL21630090 | 0.58 | — | — | |
| SCHEMBL8920852 | 0.58 | — | — | |
| SCHEMBL3157295 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3778788-B1 | COATING FILM-FORMING COMPOSITION | AGC INC (JP) | 2023-06-28 | — | — | EP | claimed |
| US-11440862-B2 | Solvent composition, cleaning method, method of forming a coating film, heat transfer fluid, and heat cycle system | AGC Inc. (JP) | 2022-09-13 | — | — | US | claimed |
| CN-109937196-B | Method for producing 1-chloro-2, 3, 3-trifluoropropene | ＡＧＣ株式会社 | 2022-08-16 | — | — | CN | claimed |
| CN-110023272-B | Method for producing 1-chloro-2, 3, 3-trifluoropropene | ＡＧＣ株式会社 | 2022-08-12 | — | — | CN | claimed |
| CN-112226302-B | Solvent composition, cleaning method, method for forming coating film, heat transfer medium, and heat cycle system | ＡＧＣ株式会社 | 2021-07-30 | — | — | CN | claimed |
| EP-3778788-A1 | COATING FILM-FORMING COMPOSITION | AGC INC. (JP) | 2021-02-17 | — | — | EP | claimed |
| CN-112226302-A | Solvent composition, cleaning method, method for forming coating film, heat transfer medium, and heat cycle system | ＡＧＣ株式会社 | 2021-01-15 | — | — | CN | claimed |
| US-20200407297-A1 | SOLVENT COMPOSITION, CLEANING METHOD, METHOD OF FORMING A COATING FILM, HEAT TRANSFER FLUID, AND HEAT CYCLE SYSTEM | AGC Inc. (JP) | 2020-12-31 | — | — | US | claimed |
| CN-107849500-B | Solvent composition, cleaning method, method for forming coating film, heat transfer medium, and heat cycle system | ＡＧＣ株式会社 | 2020-11-06 | — | — | CN | claimed |
| US-10807926-B2 | Solvent composition, cleaning method, method of forming a coating film, heat transfer fluid, and heat cycle system | AGC Inc. (JP) | 2020-10-20 | — | — | US | claimed |
| EP-3330346-B1 | SOLVENT COMPOSITION, CLEANING METHOD, METHOD OF FORMING A COATING FILM , HEAT TRANSFER MEDIUM, AND HEAT CYCLE SYSTEM | AGC INC (JP) | 2020-08-26 | — | — | EP | claimed |
| US-10654778-B2 | Method for producing 1-chloro-2,3,3-trifluoropropene | AGC Inc. (JP) | 2020-05-19 | — | — | US | claimed |
| US-20190337875-A1 | SOLVENT COMPOSITION, CLEANING METHOD, METHOD OF FORMING A COATING FILM, HEAT TRANSFER FLUID, AND HEAT CYCLE SYSTEM | AGC Inc. (JP) | 2019-11-07 | — | — | US | claimed |
| US-10414706-B2 | Solvent composition, cleaning method, method of forming a coating film, heat transfer fluid, and heat cycle system | AGC Inc. (JP) | 2019-09-17 | — | — | US | claimed |
| US-20190276381-A1 | METHOD FOR PRODUCING 1-CHLORO-2,3,3-TRIFLUOROPROPENE | AGC Inc. (JP) | 2019-09-12 | — | — | US | claimed |
| EP-3330346-A1 | SOLVENT COMPOSITION, CLEANING METHOD, COATING FILM FORMATION METHOD, HEAT TRANSFER MEDIUM, AND HEAT CYCLE SYSTEM | Asahi Glass Company, Limited (JP) | 2018-06-06 | — | — | EP | claimed |
| US-20180134640-A1 | SOLVENT COMPOSITION, CLEANING METHOD, METHOD OF FORMING A COATING FILM, HEAT TRANSFER FLUID, AND HEAT CYCLE SYSTEM | ASAHI GLASS COMPANY, LIMITED (JP) | 2018-05-17 | — | — | US | claimed |
| WO-2025105140-A1 | COMPOUND, POLYMER, RESIST COMPOSITION, RESIST FILM, AND OPTICAL ELEMENT | ＡＧＣ株式会社 | 2025-05-22 | — | — | WO | disclosed |
| US-5158617-A | Method of cleaning using hydrochlorofluorocarbons having 3 to 5 carbon atoms | ALLIED-SIGNAL INC. | 1992-10-27 | — | — | US | disclosed |
| WO-1992016674-A2 | A METHOD OF CLEANING USING HYDROCHLOROFLUOROCARBONS HAVING 3 TO 5 CARBON ATOMS | ALLIED-SIGNAL INC. (US) | 1992-10-01 | — | — | WO | disclosed |