⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18037666 | 0.81 | — | — | |
| SCHEMBL27695099 | 0.81 | — | — | |
| SCHEMBL5025202 | 0.81 | — | — | |
| SCHEMBL30888846 | 0.76 | — | — | |
| SCHEMBL5378262 | 0.73 | — | — | |
| SCHEMBL6130810 | 0.73 | — | — | |
| SCHEMBL2024521 | 0.73 | — | — | |
| SCHEMBL27453461 | 0.73 | — | — | |
| SCHEMBL3869809 | 0.73 | — | — | |
| SCHEMBL31295612 | 0.71 | TP53 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5750238-A | Electrostatic information recording medium | DAI NIPPON PRINTING CO., LTD. (JP) | 1998-05-12 | — | — | US | disclosed |
| US-5721042-A | EXCELLENT NEGATIVE ELECTRIC CHARGE AND PARTICULARLY POSITIVE CHARGE RETAINING CHARACTERISTICS; SUPERIOR IN HEAT AND MOISTURE RESISTANCE | DAI NIPPON PRINTING CO., LTD. (JP) | 1998-02-24 | — | — | US | disclosed |
| US-5527589-A | ELECTRIC CHARGE RETAINING LAYER COMPRISES AN INSULATING FLUOROCARBON RESIN IN SOLID STATE AND AN INSULATING ORGANIC SUBSTANCE HAVING NO PHOTOCONDUCTIVITY | DAI NIPPON PRINTING CO., LTD. (JP) | 1996-06-18 | — | — | US | disclosed |