SCHEMBL8646901

SCHEMBL8646901

CCCc1ccc(C=O)c(CCC)c1

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CNR1 P21554 1/20 0.41
CNR2 P34972 1/20 0.41
CDK1 P06493 1/20 0.41
ALOX5 P09917 2/20 0.40
GPR84 Q9NQS5 1/20 0.39
LPL P06858 1/20 0.38
LIPG Q9Y5X9 1/20 0.38
THRB P10828 2/20 0.37
BACE1 P56817 1/20 0.37
CA2 P00918 1/20 0.36
SRC P12931 1/20 0.35
GABRA1 P14867 1/20 0.35
GABRB2 P47870 1/20 0.35
MGLL Q99685 1/20 0.34
PLK1 P53350 1/20 0.34
ALDH1A1 P00352 2/20 0.33
L3MBTL1 Q9Y468 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9569026 0.93 CNR1 (0.37) CNR1CNR2CDK1ALOX5GPR84
SCHEMBL8649664 0.85 CDK1 (0.46) CDK1GPR84THRBCA2ALDH1A1
SCHEMBL27679855 0.84 CDK1 (0.47) CNR1CNR2CDK1ALOX5GPR84
SCHEMBL8756317 0.84 CDK1 (0.49) CDK1LPLLIPGMGLLALDH1A1
SCHEMBL18241989 0.82 CNR1 (0.42) CNR1CNR2ALOX5GPR84LPL
SCHEMBL18378515 0.82 CNR1 (0.42) CNR1CNR2ALOX5GPR84LPL
SCHEMBL31003471 0.82 CDK1 (0.51) CDK1LPLLIPGMGLLALDH1A1
SCHEMBL29749459 0.81 CNR1 (0.41) CNR1CNR2ALOX5GPR84LPL
SCHEMBL1264528 0.81 CNR1 (0.41) CNR1CNR2ALOX5GPR84LPL
SCHEMBL9481170 0.81 PRKCI (0.38) GPR84SRCALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5723253-A PHOTOSENSITIVITY FOR LITHOGRAPHIC PRINTING PLATES KONICA CORPORATION (JP) 1998-03-03 US disclosed
EP-0549339-B1 Photosensitive composition MITSUBISHI CHEM CORP (JP) 1997-05-14 EP disclosed
EP-0716344-A1 Light-sensitive composition and light-sensitive lithographic printing plate using the same KONICA CORPORATION (JP) 1996-06-12 EP disclosed
US-5338643-A O-quinonediazide photosensitive composition containing s-triazine compound, novolak resin, vinyl-based polymer and a dye MITSUBISHI KASEI CORPORATION (JP) 1994-08-16 US disclosed
EP-0328669-A1 CHALCONE DERIVATIVE COMPOUNDS NIPPON OIL AND FATS COMPANY, LIMITED (JP) 1989-08-23 EP disclosed