SCHEMBL867025

SCHEMBL867025

CC([SiH3])Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2556849 0.79
SCHEMBL7725 0.79
SCHEMBL27861402 0.78
SCHEMBL8962403 0.78
Chloromethane SCHEMBL27864111 0.75
SCHEMBL2597609 0.72
Ammonia Solution, Strong SCHEMBL3894177 0.72
Ethane SCHEMBL10716879 0.72
SCHEMBL5728116 0.72
SCHEMBL17222435 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 555 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117363057-A Method for manufacturing normal temperature solidified ceramic hydrophobic ash-proof anti-reflection film coating 中山市旌旗飞扬纳米科技有限公司 2024-01-09 CN claimed
CN-117210798-A Method for depositing metal-free ALD silicon nitride films using halide-based precursors 朗姆研究公司 2023-12-12 CN claimed
CN-113097487-B Silicon-carbon composite material with highly compact structure, and preparation method and application thereof 广东凯金新能源科技股份有限公司 2022-11-22 CN claimed
CN-115053016-A Precursors for high temperature deposition of silicon-containing films 朗姆研究公司 2022-09-13 CN claimed
CN-114901669-A Selective production of vinyl-and ethyl-functionalized chlorosilanes 美国陶氏有机硅公司 2022-08-12 CN claimed
CN-114008056-A Process for obtaining hexachlorodisilane by reacting at least one partially hydrogenated chloroethsilane on a solid non-functionalized adsorbent 瓦克化学股份公司 2022-02-01 CN claimed
CN-109608648-A A kind of polyimide material and preparation method thereof with temperature response performance 太原理工大学 2019-04-12 CN claimed
US-20170178899-A1 DIRECTIONAL DEPOSITION ON PATTERNED STRUCTURES LAM RESEARCH CORPORATION 2017-06-22 US claimed
CN-102234290-A Synthesis method of ethyl chlorosilane YANGZHOU LIUSHI CHEMICAL CO LTD 2011-11-09 CN claimed
CN-101323625-B Preparation of acetoxylsilane HUBEI HUANYU CHEMICAL CO LTD 2011-09-07 CN claimed
CN-101510602-B Method for preparing silicon composite cathode material of lithium ion battery UNIV SHANGHAI JIAOTONG 2010-11-03 CN claimed
CN-101735701-A Anti-icing paint for overhead wire and preparation method BEIJING IWHR CORP 2010-06-16 CN claimed
CN-101510602-A Method for preparing silicon composite cathode material of lithium ion battery UNIV SHANGHAI JIAOTONG (CN) 2009-08-19 CN claimed
CN-101323625-A Preparation of acetoxylsilane HUBEI HUANYU CHEMICAL CO LTD (CN) 2008-12-17 CN claimed
EP-0079043-B1 PROCESS FOR THE PREPARATION OF 2-CHLOROETHYL SILANES Wacker-Chemie GmbH (DE) 1985-08-21 EP claimed
US-20260090294-A1 DOPED SILICON OR BORON LAYER FORMATION LAM RES CORP (US) 2026-03-26 US disclosed
US-20260090293-A1 SEMICONDUCTOR STACKS AND PROCESSES THEREOF LAM RES CORP (US) 2026-03-26 US disclosed
EP-0148026-A2 Fungicidal imidazoles and triazoles E.I. DU PONT DE NEMOURS AND COMPANY (US) 1985-07-10 EP disclosed
US-4473662-A AN AMINOALKYLSILANE, AND A TERTIARY AMINE OR ORGANOTIN COMPOUND HITACHI, LTD. (JP) 1984-09-25 US disclosed
US-4152346-A FROM BETA-HALOETHYLSILANES AND AMMONIA, ADHESIVES DYNAMIT NOBEL AKTIENGESELLSCHAFT (DE) 1979-05-01 US disclosed