⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28308432 | 0.94 | TDP1 (0.43) | — | |
| SCHEMBL183370 | 0.94 | — | — | |
| Ammonia Solution, Strong SCHEMBL27688189 | 0.90 | — | — | |
| SCHEMBL11304438 | 0.90 | — | — | |
| Urea SCHEMBL9721367 | 0.90 | TDP1 (0.42) | — | |
| Ammonia Solution, Strong SCHEMBL3199943 | 0.90 | — | — | |
| Urea SCHEMBL10900550 | 0.88 | TDP1 (0.40) | — | |
| Formaldehyde SCHEMBL9721282 | 0.88 | — | — | |
| Urea SCHEMBL27741984 | 0.85 | TDP1 (0.39) | — | |
| SCHEMBL11041184 | 0.85 | TDP1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20060137104-A1 | Method of producing fabric | ZHANG YU-GAO | 2006-06-29 | — | — | US | claimed |
| EP-1492918-A4 | METHOD OF PRODUCING FABRIC | GUANGDONG ESQUEL KNITTERS CO L (CN) | 2006-06-21 | — | — | EP | claimed |
| EP-1492918-A2 | METHOD OF PRODUCING FABRIC | Guangdong Esquel Kniiters Co., Ltd. (CN) | 2005-01-05 | — | — | EP | claimed |
| US-20030135932-A1 | Method of producing fabric | GUANGDONG ESQUEL KNITTERS CO., LTD. (CN) | 2003-07-24 | — | — | US | claimed |
| WO-2003060222-A2 | METHOD OF PRODUCING FABRIC | GUANGDONG ESQUEL KNITTERS CO., LTD. (CN) | 2003-07-24 | — | — | WO | claimed |
| JP-56104958-A | — | — | None | — | — | JP | disclosed |
| US-9304399-B2 | Resist composition and method for producing semiconductor device | SONY CORPORATION (JP) | 2016-04-05 | — | — | US | disclosed |
| US-20140248777-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | SONY CORPORATION (JP) | 2014-09-04 | — | — | US | disclosed |
| US-8765353-B2 | Resist composition and method for producing semiconductor device | SONY CORPORATION (JP) | 2014-07-01 | — | — | US | disclosed |
| US-20120077343-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | SONY CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-7922776-B2 | Shrinkage inhibition; wrinkle resistance; contacting cellulose with enzyme; then overcoating with polymer | ZHANG YU-GAO | 2011-04-12 | — | — | US | disclosed |
| EP-1657276-B1 | POLYESTER FILM | TOYO BOSEKI (JP) | 2009-03-11 | — | — | EP | disclosed |
| US-6800415-B2 | COMPRISES POLYVINYLACETAL POLYMER, WATER SOLUBLE PHOTOACTIVE COMPOUND (SULFONIUM SALT), AND CROSSLINKING AGENT; FOR MICROLITHOGRAPHY | CLARIANT FINANCE (BVI) LTD (VG) | 2004-10-05 | — | — | US | disclosed |
| EP-1433028-A1 | NEGATIVE-ACTING AQUEOUS PHOTORESIST COMPOSITION | Clariant Finance (BVI) Limited (VG) | 2004-06-30 | — | — | EP | disclosed |
| WO-2003060222-A2 | METHOD OF PRODUCING FABRIC | GUANGDONG ESQUEL KNITTERS CO., LTD. (CN) | 2003-07-24 | — | — | WO | disclosed |
| US-20030135932-A1 | Method of producing fabric | GUANGDONG ESQUEL KNITTERS CO., LTD. (CN) | 2003-07-24 | — | — | US | disclosed |
| US-20030077539-A1 | Negative- acting aqueous photoresist composition | MERCK PATENT GMBH (DE) | 2003-04-24 | — | — | US | disclosed |
| WO-2003029900-A1 | NEGATIVE-ACTING AQUEOUS PHOTORESIST COMPOSITION | CLARIANT INTERNATIONAL LTD (CH) | 2003-04-10 | — | — | WO | disclosed |
| JP-S56104958-A | FIRE RETARDANT GLASS FIBER STRUCTURE AND ITS BINDER | SANWA CHEM:KK | 1981-08-21 | — | — | JP | disclosed |
| US-3963668-A | GLASS FIBERS, ALKOXYMETHYL UREAS | BASF AKTIENGESELLSCHAFT (DT) | 1976-06-15 | — | — | US | disclosed |