⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11368646 | 0.72 | — | — | |
| SCHEMBL5778825 | 0.65 | — | — | |
| SCHEMBL6004990 | 0.64 | — | — | |
| SCHEMBL6005128 | 0.64 | — | — | |
| SCHEMBL522515 | 0.64 | — | — | |
| SCHEMBL821344 | 0.62 | — | — | |
| Hydrochloric Acid SCHEMBL5317909 | 0.62 | — | — | |
| SCHEMBL617496 | 0.60 | — | — | |
| SCHEMBL3661121 | 0.60 | — | — | |
| SCHEMBL4557452 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-10335185-A | — | — | None | — | — | JP | disclosed |
| CN-112034686-A | High-sensitivity photosensitive resin composition | 浙江福斯特新材料研究院有限公司 | 2020-12-04 | — | — | CN | disclosed |
| CN-104111583-B | Photosensitive polymer combination, photosensitive element, the forming method of photoresist figure and the manufacturing method of printed circuit board | 日立化成株式会社 | 2019-01-01 | — | — | CN | disclosed |
| CN-104133342-B | Photosensitive polymer combination, photosensitive element, the forming method of photoresist figure and the manufacture method of printed circuit board (PCB) | 日立化成株式会社 | 2018-01-23 | — | — | CN | disclosed |
| US-5460907-A | Polymer, optical chromophore, charge transport agent; diffraction efficiency; waveguides | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1995-10-24 | — | — | US | disclosed |
| EP-0195743-B1 | ENOL ETHERS, PROCESS FOR THEIR PREPARATION, ALPHA-PYRONES, PROCESS FOR THEIR PREPARATION AND USE OF THE ALPHA-PYRONES | CIBA-GEIGY AG (CH) | 1990-08-01 | — | — | EP | disclosed |
| US-4824221-A | Electrochromic device | NIKON CORPORATION (JP) | 1989-04-25 | — | — | US | disclosed |
| EP-0195743-A2 | Enol ethers, process for their preparation, alpha-pyrones, process for their preparation and use of the alpha-pyrones | CIBA-GEIGY AG (CH) | 1986-09-24 | — | — | EP | disclosed |