SCHEMBL867745

SCHEMBL867745

OCCOCCOCCOCCOCC(O)CO

nearest known ligand 0.55

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.55
KMT2A Q03164 2/20 0.55
USP2 O75604 1/20 0.52
TSHR P16473 2/20 0.50
MAPK1 P28482 1/20 0.50
LMNA P02545 3/20 0.38
ALDH1A1 P00352 2/20 0.38
THRB P10828 2/20 0.38
HTT P42858 2/20 0.38
MAPT P10636 1/20 0.38
HSD17B10 Q99714 1/20 0.36
CYP1A2 P05177 2/20 0.34
AGTR1 P30556 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.31
KDM4E B2RXH2 1/20 0.31
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27620890 1.00 MEN1 (0.55) MEN1KMT2AUSP2TSHRMAPK1
SCHEMBL12050435 1.00 MEN1 (0.55) MEN1KMT2AUSP2TSHRMAPK1
SCHEMBL541678 1.00 MEN1 (0.55) MEN1KMT2AUSP2TSHRMAPK1
SCHEMBL11352485 1.00 MEN1 (0.55) MEN1KMT2AUSP2TSHRMAPK1
SCHEMBL5713071 1.00 MEN1 (0.55) MEN1KMT2AUSP2TSHRMAPK1
SCHEMBL7697770 0.95
SCHEMBL269833 0.95
Ethylene Glycol SCHEMBL27538538 0.92 USP2 (0.54) MEN1KMT2AUSP2TSHRMAPK1
SCHEMBL28011925 0.92 USP2 (0.54) MEN1KMT2AUSP2TSHRMAPK1
Hydrochloric Acid SCHEMBL28194872 0.92 USP2 (0.54) MEN1KMT2AUSP2TSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023090879-A1 PAPER PIPE FOR SMOKING ARTICLE COMPRISING FLAVORING SHEET, AND SMOKING ARTICLE 주식회사 케이티앤지 2023-05-25 WO claimed
EP-2287131-B1 Slurry-derived environmental barrier coatings GEN ELECTRIC (US) 2020-09-02 EP claimed
US-20130089720-A1 WATER BASED SLURRY COMPOSITIONS FOR MAKING ENVIRONMENTAL BARRIER COATINGS AND ENVIRONMENTAL BARRIER COATINGS COMPRISING THE SAME GENERAL ELECTRIC COMPANY (US) 2013-04-11 US claimed
EP-2287131-A2 Slurry compositions for making environmental barrier coatings and environmental barrier coatings comprising the same General Electric Company (US) 2011-02-23 EP claimed
EP-2284138-A2 Water based slurry compositions for making environmental barrier coatings General Electric Company (US) 2011-02-16 EP claimed
US-20110027556-A1 SLURRY COMPOSITIONS FOR MAKING ENVIRONMENTAL BARRIER COATINGS AND ENVIRONMENTAL BARRIER COATINGS COMPRISING THE SAME DEPARTMENT OF THE NAVY 2011-02-03 US claimed
US-20110027578-A1 WATER BASED SLURRY COMPOSITIONS FOR MAKING ENVIRONMENTAL BARRIER COATINGS AND ENVIRONMENTAL BARRIER COATINGS COMPRISING THE SAME GENERAL ELECTRIC COMPANY 2011-02-03 US claimed
US-11851380-B2 Slurry processing for deposition of rare earth hafnium tantalate based barrier coatings GENERAL ELECTRIC COMPANY (US) 2023-12-26 US disclosed
CN-116426998-A Forming barrier coatings using electrophoretic deposition of slurries 通用电气公司 2023-07-14 CN disclosed
US-20230220580-A1 FORMATION OF A BARRIER COATING USING ELECTROPHORETIC DEPOSITION OF A SLURRY GENERAL ELECTRIC COMPANY 2023-07-13 US disclosed
WO-2023090879-A1 PAPER PIPE FOR SMOKING ARTICLE COMPRISING FLAVORING SHEET, AND SMOKING ARTICLE 주식회사 케이티앤지 2023-05-25 WO disclosed
EP-2287133-B1 Methods for making water based environmental barrier coatings using sintering aids GEN ELECTRIC (US) 2023-01-11 EP disclosed
CN-115404430-A Suspension plasma spray compositions and processes for depositing rare earth hafnium tantalate-based coatings 通用电气公司 2022-11-29 CN disclosed
US-20110027484-A1 METHODS FOR MAKING ENVIRONMENTAL BARRIER COATINGS USING SINTERING AIDS GENERAL ELECTRIC COMPANY 2011-02-03 US disclosed
US-20110027467-A1 METHODS OF MAKING ENVIRONMENTAL BARRIER COATINGS FOR HIGH TEMPERATURE CERAMIC COMPONENTS USING SINTERING AIDS GENERAL ELECTRIC COMPANY 2011-02-03 US disclosed
CN-100371401-C Ink composition and method of ink-jet recording FUJI PHOTO FILM CO LTD (JP) 2008-02-27 CN disclosed
CN-1969021-A Photosensitive optically variable ink compositions protected by an identifying feature and methods thereof PITNEY BOWES INC (US) 2007-05-23 CN disclosed
US-7115706-B2 Polyether polymers and compositions derived therefrom BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY (US) 2006-10-03 US disclosed
US-20050209430-A1 Polyether polymers and compositions derived therefrom BOARD OF TRUSTEES MICHIGAN STATE UNIVERSITY (US) 2005-09-22 US disclosed
CN-1628156-A Ink composition and method of ink-jet recording FUJI PHOTO FILM CO LTD (JP) 2005-06-15 CN disclosed