SCHEMBL8677609

SCHEMBL8677609

CCC1CCOS1(=O)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11897589 0.86
SCHEMBL14369286 0.82 EPHX1 (0.33)
SCHEMBL16389147 0.80 EPHX1 (0.36)
SCHEMBL12345767 0.79 EPHX1 (0.44)
SCHEMBL12345770 0.75
SCHEMBL11444699 0.73 PRSS1 (0.30)
SCHEMBL24943191 0.69
SCHEMBL17922757 0.69
SCHEMBL353546 0.67
SCHEMBL22225126 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9847549-B2 Electrolyte and rechargeable lithium battery including same SAMSUNG SDI CO., LTD. (KR) 2017-12-19 US claimed
US-20140242453-A1 ELECTROLYTE AND RECHARGEABLE LITHIUM BATTERY INCLUDING SAME SAMSUNG SDI CO., LTD. (KR) 2014-08-28 US claimed
US-20240238867-A1 DEPOSITION OF REACTIVE METALS WITH PROTECTION LAYER FOR HIGH VOLUME MANUFACTURING ELEVATED MATERIALS US LLC 2024-07-18 US disclosed
US-11969781-B2 Deposition of reactive metals with protection layer for high volume manufacturing APPLIED MATERIALS, INC. (US) 2024-04-30 US disclosed
US-11833580-B2 Deposition of reactive metals with protection layer for high volume manufacturing APPLIED MATERIALS, INC. (US) 2023-12-05 US disclosed
CN-114680106-B Antibacterial liquid, preparation method and application thereof, and antibacterial product 中国科学院化学研究所 2022-09-20 CN disclosed
CN-114561128-B Antifogging agent, preparation method and application thereof, and antifogging product 中国科学院化学研究所 2022-09-02 CN disclosed
CN-114680106-A Antibacterial liquid, preparation method and application thereof, and antibacterial product 中国科学院化学研究所 2022-07-01 CN disclosed
CN-114561128-A Antifogging agent, preparation method and application thereof, and antifogging product 中国科学院化学研究所 2022-05-31 CN disclosed
US-20220152693-A1 DEPOSITION OF REACTIVE METALS WITH PROTECTION LAYER FOR HIGH VOLUME MANUFACTURING ELEVATED MATERIALS US LLC 2022-05-19 US disclosed
US-20220029199-A1 NON-AQUEOUS ELECTROLYTE SOLUTION FOR BATTERY AND LITHIUM SECONDARY BATTERY MITSUI CHEMICALS, INC. (JP) 2022-01-27 US disclosed
US-9196903-B2 Nonaqueous-electrolyte batteries and nonaqueous electrolytic solutions MITSUBISHI CHEMICAL CORPORATION (JP) 2015-11-24 US disclosed
WO-2015004236-A1 DRYING OF ELECTROLYTE MIXTURES CONTAINING ACIDS WITH MOLECULAR SIEVES BASF SE (DE) 2015-01-15 WO disclosed
US-20140242453-A1 ELECTROLYTE AND RECHARGEABLE LITHIUM BATTERY INCLUDING SAME SAMSUNG SDI CO., LTD. (KR) 2014-08-28 US disclosed
US-20130084493-A1 NONAQUEOUS-ELECTROLYTE BATTERIES AND NONAQUEOUS ELECTROLYTIC SOLUTIONS MITSUBISHI CHEMICAL CORPORATION (JP) 2013-04-04 US disclosed
US-20120244425-A1 NONAQUEOUS-ELECTROLYTE BATTERIES AND NONAQUEOUS ELECTROLYTIC SOLUTIONS MITSUBISHI CHEMICAL CORPORATION (JP) 2012-09-27 US disclosed
EP-2485316-A1 NONAQUEOUS ELECTROLYTE BATTERY AND NONAQUEOUS ELECTROLYTE SOLUTION Mitsubishi Chemical Corporation (JP) 2012-08-08 EP disclosed
US-7851575-B2 Polycyclic polymers containing pendant ion conducting moieties PROMERUS LLC (US) 2010-12-14 US disclosed
US-7312292-B2 Polycyclic polymers containing pendant ion conducting moieties PROMERUS LLC (US) 2007-12-25 US disclosed
US-5763152-A Silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1998-06-09 US disclosed