Glycinebetaine

Glycinebetaine

SCHEMBL8725957

C[N+](C)(C)CC(=O)[O-].[P]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

BHMTBHMT2

The experimentally established mechanism targets of Glycinebetaine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Glycinebetaine SCHEMBL8678519 0.97 TSHR (0.53)
Glycinebetaine SCHEMBL2803780 0.97 TSHR (0.53)
Betaine SCHEMBL31467313 0.97
Glycinebetaine SCHEMBL4900209 0.97
Glycinebetaine SCHEMBL7739 0.97
Glycinebetaine SCHEMBL11109389 0.94
Glycinebetaine SCHEMBL4255367 0.94
Glycinebetaine SCHEMBL8388807 0.94
Glycinebetaine SCHEMBL4457941 0.94 TSHR (0.50)
Glycinebetaine SCHEMBL20703289 0.94

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101107285-B Epoxy resin composition, method for making the composition latent, and semiconductor device SUMITOMO BAKELITE CO 2011-01-12 CN claimed
CN-101107285-A Epoxy resin composition, method for making the composition latent, and semiconductor device SUMITOMO BAKELITE CO (JP) 2008-01-16 CN claimed
EP-0354404-B1 Phosphorus betaines, process for their preparation and their use, particularly for industrial purposes GOLDSCHMIDT AG TH (DE) 1994-07-06 EP claimed
WO-2023032747-A1 RECYCLING TREATMENT DEVICE, WASHING-OUT DEVICE, AND METHOD FOR MANUFACTURING FLEXOGRAPHIC PRINTING PLATE 富士フイルム株式会社 2023-03-09 WO disclosed
WO-2023008368-A1 WASH-OUT DEVICE AND WASH-OUT METHOD 富士フイルム株式会社 2023-02-02 WO disclosed
CN-101107285-B Epoxy resin composition, method for making the composition latent, and semiconductor device SUMITOMO BAKELITE CO 2011-01-12 CN disclosed
CN-101107285-A Epoxy resin composition, method for making the composition latent, and semiconductor device SUMITOMO BAKELITE CO (JP) 2008-01-16 CN disclosed
CN-1649955-A Dust repellant compositions PETROFERM INC (US) 2005-08-03 CN disclosed
US-5744058-A Dienes and liquid-crystalline media MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1998-04-28 US disclosed