SCHEMBL8733595

SCHEMBL8733595

O=C(CCCC(=O)c1ccc(O)cc1)c1ccc(O)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 1.00
RAB9A P51151 2/20 1.00
HSD17B3 P37058 8/20 0.76
L3MBTL1 Q9Y468 3/20 0.71
GAA P10253 2/20 0.71
TDP1 Q9NUW8 2/20 0.71
KDM4E B2RXH2 1/20 0.71
ALDH1A1 P00352 1/20 0.71
ABL1 P00519 1/20 0.71
POLB P06746 1/20 0.71
ALPI P09923 1/20 0.71
ALPG P10696 1/20 0.71
APEX1 P27695 1/20 0.71
CASP3 P42574 1/20 0.71
RECQL P46063 1/20 0.71
BLM P54132 1/20 0.71
CASP7 P55210 1/20 0.71
CASP6 P55212 1/20 0.71
MCL1 Q07820 1/20 0.71
RIN1 Q13671 1/20 0.71

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL124008 0.95 NPC1 (0.91) NPC1RAB9AHSD17B3L3MBTL1GAA
SCHEMBL10341614 0.93 NPC1 (0.86) NPC1RAB9AHSD17B3L3MBTL1GAA
SCHEMBL8614024 0.93 NPC1 (0.86) NPC1RAB9AHSD17B3L3MBTL1GAA
SCHEMBL10341631 0.93 NPC1 (0.86) NPC1RAB9AHSD17B3L3MBTL1GAA
SCHEMBL7163686 0.93 NPC1 (0.86) NPC1RAB9AHSD17B3L3MBTL1GAA
SCHEMBL8519713 0.93 NPC1 (0.86) NPC1RAB9AHSD17B3L3MBTL1GAA
SCHEMBL8622942 0.93 NPC1 (0.86) NPC1RAB9AHSD17B3L3MBTL1GAA
SCHEMBL99460 0.91 NPC1 (0.83) NPC1RAB9AHSD17B3L3MBTL1GAA
SCHEMBL17937287 0.91 NPC1 (0.83) NPC1RAB9AHSD17B3L3MBTL1GAA
SCHEMBL7939950 0.90 NPC1 (0.81) NPC1RAB9AHSD17B3L3MBTL1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0555861-B1 Positive photoresist composition FUJI PHOTO FILM CO LTD (JP) 1998-11-11 EP disclosed
US-5340688-A Containing mixture of 1,2-naphthoquinonediazidosulfonate esters of polyhydroxy compounds and alkali soluble resin FUJI PHOTO FILM CO., LTD. (JP) 1994-08-23 US disclosed
US-5318875-A Resolution; heat resistance; photosensitivity; developability; integrated circuits; semiconductors FUJI PHOTO FILM CO., LTD. (JP) 1994-06-07 US disclosed
EP-0555861-A1 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1993-08-18 EP disclosed
EP-0210564-B1 PROCESS FOR PRODUCING BIS-HYDROXYPHENYL-N-ALKANES BAYER AG (DE) 1990-04-04 EP disclosed
US-4716252-A FLUORINE-CONTAINING ORGANIC SULFONIC ACID ACYLATION CATALYST BAYER AKTIENGESELLSCHAFT (DE) 1987-12-29 US disclosed
EP-0210564-A2 Process for producing bis-hydroxyphenyl-n-alkanes BAYER AG (DE) 1987-02-04 EP disclosed