SCHEMBL8736330

SCHEMBL8736330

CC1CN(CCN)CCN1

nearest known ligand 0.46

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
BIRC2 Q13490 9/20 0.46
ALOX15 P16050 2/20 0.42
CHRM1 P11229 2/20 0.34
XIAP P98170 6/20 0.33
GRIN2D O15399 2/20 0.32
GRIN3B O60391 2/20 0.32
THRB P10828 2/20 0.32
GRIN1 Q05586 2/20 0.32
GRIN2A Q12879 2/20 0.32
GRIN2B Q13224 2/20 0.32
GRIN2C Q14957 2/20 0.32
GRIN3A Q8TCU5 2/20 0.32
CYP1A2 P05177 1/20 0.32
CYP2C19 P33261 1/20 0.32
HSD17B10 Q99714 1/20 0.32
LMNA P02545 1/20 0.32
RECQL P46063 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4089011 0.88 BIRC2 (0.44) BIRC2ALOX15CHRM1XIAPGRIN2D
SCHEMBL29300888 0.83 BIRC2 (0.46) BIRC2ALOX15CHRM1XIAPGRIN2D
SCHEMBL22656911 0.82 ACE2 (0.53) BIRC2ALOX15CHRM1GRIN2DGRIN3B
SCHEMBL17591405 0.81 BIRC2 (0.47) BIRC2CHRM1
SCHEMBL13772197 0.81 BIRC2 (0.47) BIRC2CHRM1
SCHEMBL3110486 0.81 BIRC2 (0.47) BIRC2CHRM1
SCHEMBL20492608 0.79 BIRC2 (0.50) BIRC2ALOX15XIAPGRIN2DGRIN3B
SCHEMBL293973 0.79 BIRC2 (0.46) BIRC2ALOX15CHRM1XIAPGRIN2D
SCHEMBL1191101 0.79 BIRC2 (0.50) BIRC2ALOX15XIAPGRIN2DGRIN3B
SCHEMBL9938927 0.79 BIRC2 (0.50) BIRC2ALOX15XIAPGRIN2DGRIN3B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240375396-A1 PHOTOSENSITIVE RESIN PRINTING PLATE PRECURSOR FOR RELIEF PRINTING, AND PRINTING PLATE TOYOBO MC CORPORATION (JP) 2024-11-14 US disclosed
EP-4411479-A1 PRINTING ORIGINAL PLATE FOR PHOTOSENSITIVE RESIN LETTERPRESS, AND PRINTING PLATE TOYOBO MC Corporation (JP) 2024-08-07 EP disclosed
CN-118076923-A Printing original plate for photosensitive resin relief printing plate and printing plate 东洋纺MC株式会社 2024-05-24 CN disclosed
CN-110997659-B Process for preparing propylene amine and propylene amine derivatives 诺力昂化学品国际有限公司 2023-09-12 CN disclosed
WO-2023054272-A1 PRINTING ORIGINAL PLATE FOR PHOTOSENSITIVE RESIN LETTERPRESS, AND PRINTING PLATE 東洋紡株式会社 2023-04-06 WO disclosed
CN-110997659-A Process for preparing propyleneamine and propyleneamine derivatives 诺力昂化学品国际有限公司 2020-04-10 CN disclosed
CN-1759110-A Pyrazole derivatives DAIICHI SEIYAKU CO (JP) 2006-04-12 CN disclosed
EP-0470636-B1 A photosensitive resin composition TOYO BOSEKI (JP) 1998-11-18 EP disclosed
US-5204223-A Soluble synthetic polymer, photopolymerizable unsaturated compound and photopolymerization inhibitor TOYO BOSEKI KABUSHIKI KAISHA (JP) 1993-04-20 US disclosed
EP-0470636-A1 A photosensitive resin composition Toyo Boseki Kabushiki Kaisha (JP) 1992-02-12 EP disclosed
US-4405705-A HYDROPHILIC TOYO BOSEKI KABUSHIKI KAISHA T/A TOYOBA CO., LTD. (JP) 1983-09-20 US disclosed
US-4220704-A Water soluble photosensitive resin compositions comprising a polyamide or its salt TOYOBO CO., LTD. (JP) 1980-09-02 US disclosed
US-4145222-A Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt TOYOBO CO., LTD. (JP) 1979-03-20 US disclosed