SCHEMBL8737498

SCHEMBL8737498

CCC(F)(F)C(C)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15697268 0.81 TSHR (0.32)
SCHEMBL7181757 0.79 TSHR (0.39)
SCHEMBL10299571 0.79 TSHR (0.35)
SCHEMBL19157273 0.77
SCHEMBL20730465 0.77
SCHEMBL16473056 0.76 TSHR (0.33)
SCHEMBL20016198 0.74 TSHR (0.32)
SCHEMBL16473058 0.74 TSHR (0.32)
SCHEMBL14503977 0.74 TSHR (0.32)
SCHEMBL10299572 0.74 TSHR (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023218995-A1 ADSORPTION AGENT, MOLDED ARTICLE, COMPOSITION, PRODUCTION METHOD FOR COMPOUND, AND COMPOUND ダイキン工業株式会社 2023-11-16 WO disclosed
US-20230280651-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-07 US disclosed
US-20230275221-A1 ELECTRODE COMPOSITION, ELECTRODE SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, AND ALL-SOLID STATE SECONDARY BATTERY, AND MANUFACTURING METHODS FOR ELECTRODE SHEET FOR ALL-SOLID STATE SECONDARY BATTERY AND ALL-SOLID STATE SECONDARY BATTERY FUJIFILM CORPORATION (JP) 2023-08-31 US disclosed
US-20230227604-A1 FLUORINATED AROMATIC POLYMER AND METHOD FOR PRODUCING SAME DAIKIN INDUSTRIES, LTD. (JP) 2023-07-20 US disclosed
US-20230227604-A1 FLUORINATED AROMATIC POLYMER AND METHOD FOR PRODUCING SAME DAIKIN INDUSTRIES, LTD. (JP) 2023-07-20 US disclosed
US-11693314-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 US disclosed
US-20220236643-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-07-28 US disclosed
US-11340527-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-05-24 US disclosed
US-20210200083-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-07-01 US disclosed
US-20210141306-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-13 US disclosed
WO-1992010454-A1 PARTIALLY FLUORINATED ALKANOLS HAVING A TERTIARY STRUCTURE ALLIED-SIGNAL INC. (US) 1992-06-25 WO disclosed
US-5118359-A Method of cleaning using partially fluorinated alkanes having a tertiary structure as solvent ALLIED-SIGNAL INC. (US) 1992-06-02 US disclosed
US-5118360-A Method of cleaning using partially fluorinated alkenes having a tertiary structure as solvent ALLIED-SIGNAL INC. 1992-06-02 US disclosed
US-5087777-A Solvents ALLIED-SIGNAL INC. (US) 1992-02-11 US disclosed
WO-1992000263-A1 PARTIALLY FLUORINATED ALKANES HAVING A TERTIARY STRUCTURE ALLIED-SIGNAL INC. (US) 1992-01-09 WO disclosed
US-5059728-A Solvents; industrial cleaning applications ALLIED-SIGNAL INC. (US) 1991-10-22 US disclosed
US-4950679-A Alkanesulfonate derivatives and their use as insecticides, acaricides or nematicides NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1990-08-21 US disclosed
US-4791127-A Alkanesulfonate derivatives and their use as insecticides, acaricides or nematicides NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1988-12-13 US disclosed
EP-0256765-A1 Plastic cladding composition for plastic core optical fiber, and plastic core optical fiber prepared therefrom MITSUBISHI RAYON CO., LTD. (JP) 1988-02-24 EP disclosed
EP-0220857-A1 Alkanesulfonate derivatives and their use as insecticides, acaricides or nematicides Nippon Kayaku Kabushiki Kaisha (JP) 1987-05-06 EP disclosed