SCHEMBL8748823

SCHEMBL8748823

C=C(C)C[Si](C)(C)O[Si](C)(C)CC(=C)C

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17922846 0.80
SCHEMBL1225558 0.71
SCHEMBL31707471 0.70 TSHR (0.33)
SCHEMBL332508 0.69
SCHEMBL18221797 0.69 HSD17B10 (0.32) HSD17B10TDP1
SCHEMBL11572882 0.67 HSD17B10 (0.41) HSD17B10TDP1
SCHEMBL1317714 0.67 HSD17B10 (0.42) HSD17B10TDP1
SCHEMBL22653554 0.67
SCHEMBL1317509 0.67
SCHEMBL1491037 0.65 HSD17B10 (0.33) HSD17B10TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0552548-B1 Resist material WAKO PURE CHEM IND LTD (JP) 1997-03-19 EP claimed
EP-0552548-A1 Resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1993-07-28 EP claimed
JP-8211612-A None JP disclosed
US-5627006-A ALKENYLOXY-SUBSTITUTED POLYVINYLPHENOLS, PHOTOSENSITIVE ACID GENERATOR WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1997-05-06 US disclosed
EP-0552548-B1 Resist material WAKO PURE CHEM IND LTD (JP) 1997-03-19 EP disclosed
JP-H08211612-A NOVEL RESIST MATERIAL WAKO PURE CHEM IND LTD 1996-08-20 JP disclosed
EP-0552548-A1 Resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1993-07-28 EP disclosed