SCHEMBL8750362

SCHEMBL8750362

CCC(OC)c1ccc(C)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AOC3 Q16853 4/20 0.39
CHRNA7 P36544 1/20 0.38
ACHE P22303 3/20 0.37
ALDH1A1 P00352 2/20 0.37
LMNA P02545 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
TDP1 Q9NUW8 1/20 0.36
FFAR1 O14842 1/20 0.36
MAPT P10636 1/20 0.35
SLC6A2 P23975 1/20 0.33
SLC6A4 P31645 1/20 0.33
MLKL Q8NB16 1/20 0.33
UTS2R Q9UKP6 1/20 0.33
MEN1 O00255 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL726138 0.91 AOC3 (0.44) AOC3LMNATDP1MAPTSLC6A2
SCHEMBL8750631 0.84 CHRNA7 (0.44) CHRNA7ACHEALDH1A1LMNASMN1; SMN2
SCHEMBL12014018 0.83 AOC3 (0.37) AOC3CHRNA7ACHEALDH1A1TDP1
SCHEMBL19816398 0.80 AOC3 (0.38) AOC3CHRNA7ACHEALDH1A1TDP1
SCHEMBL18257696 0.80 AOC3 (0.42) AOC3CHRNA7ACHEALDH1A1TDP1
SCHEMBL8251511 0.80 AOC3 (0.38) AOC3CHRNA7ACHEALDH1A1TDP1
SCHEMBL13569343 0.80 AOC3 (0.42) AOC3CHRNA7ACHEALDH1A1TDP1
SCHEMBL13569341 0.80 AOC3 (0.42) AOC3CHRNA7ACHEALDH1A1TDP1
SCHEMBL10785818 0.80 AOC3 (0.38) AOC3CHRNA7ACHEALDH1A1TDP1
SCHEMBL7719508 0.80 AOC3 (0.38) AOC3CHRNA7ACHEALDH1A1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210187902-A1 LAMINATE, ELECTRONIC DEVICE, AND PRODUCTION METHOD FOR LAMINATE JNC CORPORATION (JP) 2021-06-24 US disclosed
US-10679922-B2 Composition for heat-dissipating member, heat-dissipating member, electronic instrument, method for producing composition for heat-dissipating member, and method for producing heat-dissipating member JNC CORPORATION (JP) 2020-06-09 US disclosed
US-20190055444-A1 COMPOSITION FOR LOW THERMAL EXPANSION MEMBERS, LOW THERMAL EXPANSION MEMBER, ELECTRONIC DEVICE, AND METHOD FOR PRODUCING LOW THERMAL EXPANSION MEMBER JNC CORPORATION (JP) 2019-02-21 US disclosed
US-20190023900-A1 COMPOSITION FOR HEAT-DISSIPATING MEMBER, HEAT-DISSIPATING MEMBER, ELECTRONIC INSTRUMENT, METHOD FOR PRODUCING COMPOSITION FOR HEAT-DISSIPATING MEMBER, AND METHOD FOR PRODUCING HEAT-DISSIPATING MEMBER JNC CORPORATION (JP) 2019-01-24 US disclosed
WO-2015116485-A1 PYRAZOLE COMPOUNDS AS BTK INHIBITORS BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) 2015-08-06 WO disclosed
US-7368219-B2 Polymer for forming anti-reflective coating layer DONGJIN SEMICHEM CO., LTD. (KR) 2008-05-06 US disclosed
US-7172855-B2 Silver halide photographic light-sensitive material and package thereof FUJI PHOTO FILM CO., LTD. (JP) 2007-02-06 US disclosed
EP-0523697-B1 Color-developing compositions and their use MITSUI TOATSU CHEMICALS (JP) 1997-04-02 EP disclosed
EP-0268878-B1 Salicylic acid copolymers and their metal salts, production process thereof, color-developing agents comprising metal salts of the copolymers and color-developing sheets employing the agents MITSUI TOATSU CHEMICALS (JP) 1996-01-31 EP disclosed
US-5447901-A Color-developing sheet: base material coated with composition of /a/ multivalent metal-modified salicylic acid resin formed from salicylic acid, a benzyl compound and optional styrene and /b/ analogous resin free of salicylic acid MITSUI TOATSU CHEMICAL, INC. (JP) 1995-09-05 US disclosed
US-5376615-A Pressure sensitive elements containing a salicylic acid resin and a phenolic resin MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1994-12-27 US disclosed
EP-0523697-A1 Color-developing compositions and their use MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-01-20 EP disclosed
US-5023366-A Reacted with a benzyl halide, alcohol or ether; for pressure sensitive elements MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1991-06-11 US disclosed
EP-0293739-B1 METHOD FOR THE PRODUCTION OF 4-ISOPROPYL-CYCLOHEXYLMETHANOL OR ITS ALKYL ETHERS BASF Aktiengesellschaft (DE) 1990-11-14 EP disclosed
EP-0268878-A2 Salicylic acid copolymers and their metal salts, production process thereof, color-developing agents comprising metal salts of the copolymers and color-developing sheets employing the agents MITSUI TOATSU CHEMICALS, Inc. (JP) 1988-06-01 EP disclosed