SCHEMBL8752679

SCHEMBL8752679

O=c1cc(C(Br)(Br)Br)[nH]c2ccccc12

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 7/20 0.71
▸ GAA P10253 3/20 0.56
▸ CYP1A2 P05177 3/20 0.56
▸ HPGD P15428 6/20 0.53
▸ CTSV O60911 5/20 0.53
▸ CTSL P07711 5/20 0.53
▸ LMNA P02545 4/20 0.53
▸ HSD17B10 Q99714 2/20 0.53
▸ TUBB4A P04350 1/20 0.53
▸ TP53 P04637 1/20 0.53
▸ TUBB P07437 1/20 0.53
▸ TUBA3C P0DPH7 1/20 0.53
▸ TUBA1B P68363 1/20 0.53
▸ TUBA4A P68366 1/20 0.53
▸ TUBB4B P68371 1/20 0.53
▸ TUBB3 Q13509 1/20 0.53
▸ TUBB2A Q13885 1/20 0.53
▸ TUBB8 Q3ZCM7 1/20 0.53
▸ TUBA3E Q6PEY2 1/20 0.53
▸ NPSR1 Q6W5P4 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9179305 0.83 KDM4E (1.00) KDM4EGAACYP1A2HPGDCTSV
SCHEMBL12724790 0.83 KDM4E (0.69) KDM4EGAACYP1A2HPGDCTSV
SCHEMBL29976744 0.83 KDM4E (1.00) KDM4EGAACYP1A2HPGDCTSV
SCHEMBL2639080 0.73 DAO (0.61) KDM4EGAACYP1A2HPGDCTSV
SCHEMBL18995263 0.72 CYP1A2 (0.60) KDM4EGAACYP1A2HPGDCTSV
SCHEMBL7938807 0.72 CYP1A2 (0.60) KDM4EGAACYP1A2HPGDCTSV
SCHEMBL7815453 0.72 CYP1A2 (0.60) KDM4EGAACYP1A2HPGDCTSV
SCHEMBL4741376 0.72 GAA (0.60) KDM4EGAACYP1A2HPGDCTSV
SCHEMBL527043 0.72 CYP1A2 (1.00) KDM4EGAACYP1A2HPGDCTSV
SCHEMBL30199901 0.72 GAA (0.60) KDM4EGAACYP1A2HPGDCTSV

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0602376-B1 N,N-Disubstituted sulfonamides and radiation-sensitive composition produced therewith HOECHST AG (DE) 1997-04-23 — — EP disclosed
US-5612169-A USED IN MANUFACTURE OF OFFSET PRINTING PLATES AND PHOTORESISTS HOECHST AKTIENGESELLSCHAFT (DE) 1997-03-18 — — US disclosed
EP-0602377-B1 Polymers containing N,N-disubstituted sulfonamide side groups and their use in radiation-sensitive compositions HOECHST AG (DE) 1996-10-09 — — EP disclosed
US-5529886-A PHOTOSENSITIVE MIXTURE OF A COMPOUND WHICH ON EXPOSURE TO ACTINIC RADIATION FORMS ACID, AND AN ACID-CLEAVABLE ACRYLATE HOMO OR COPOLYMER HOECHST AKTIENGESELLSCHAFT (DE) 1996-06-25 — — US disclosed
US-5442087-A Preparing offset printing plates and photoresists HOECHST AKTIENGESELLSCHAFT (DE) 1995-08-15 — — US disclosed
EP-0602376-A1 N,N-Disbustituted sulfonamides and radiation-sensitive composition produced therewith HOECHST AKTIENGESELLSCHAFT (DE) 1994-06-22 — — EP disclosed
EP-0602377-A1 Polymers containing N,N-disubstituted sulfonamide side groups and their use in radiation-sensitive compositions HOECHST AKTIENGESELLSCHAFT (DE) 1994-06-22 — — EP disclosed
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