SCHEMBL8765427

SCHEMBL8765427

Cc1ccc(N(c2ccccc2)c2cccc(Nc3ccccc3)c2)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 2/20 0.57
NPSR1 Q6W5P4 1/20 0.56
MAPT P10636 4/20 0.50
MEN1 O00255 4/20 0.50
KMT2A Q03164 4/20 0.50
ALDH1A1 P00352 4/20 0.50
AR P10275 1/20 0.50
GAA P10253 3/20 0.43
TDP1 Q9NUW8 3/20 0.43
CYP3A4 P08684 3/20 0.43
LMNA P02545 2/20 0.43
TSHR P16473 2/20 0.43
KDM4E B2RXH2 2/20 0.43
GFER P55789 1/20 0.43
HSD17B10 Q99714 4/20 0.42
MAPK1 P28482 2/20 0.42
L3MBTL1 Q9Y468 4/20 0.41
KDM1A O60341 1/20 0.41
ALOX15 P16050 1/20 0.40
ALOX12 P18054 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13061699 0.92 HPGD (0.53) HPGDNPSR1MAPTMEN1KMT2A
SCHEMBL18659471 0.91 NPSR1 (0.64) HPGDNPSR1MAPTMEN1KMT2A
SCHEMBL13175108 0.90 NPSR1 (0.68) HPGDNPSR1MAPTMEN1KMT2A
SCHEMBL12955888 0.89 HPGD (0.72) HPGDNPSR1MAPTMEN1KMT2A
SCHEMBL29595268 0.89 MAPT (0.62) HPGDNPSR1MAPTMEN1KMT2A
SCHEMBL16890463 0.89 MAPT (0.62) HPGDNPSR1MAPTMEN1KMT2A
SCHEMBL20160611 0.88 NPSR1 (0.70) HPGDNPSR1MAPTMEN1KMT2A
SCHEMBL24400123 0.87 MAPT (0.60) HPGDNPSR1MAPTMEN1KMT2A
SCHEMBL12700477 0.87 HPGD (0.68) HPGDNPSR1MAPTMEN1KMT2A
SCHEMBL22044806 0.87 HPGD (0.68) HPGDNPSR1MAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0420207-B1 Electrophotosensitive material and method of manufacturing the same MITA INDUSTRIAL CO LTD (JP) 1997-08-13 EP disclosed
EP-0420207-A2 Electrophotosensitive material and method of manufacturing the same MITA INDUSTRIAL CO. LTD. (JP) 1991-04-03 EP disclosed