SCHEMBL8769608

SCHEMBL8769608

C=C[SiH](C)CCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15305266 0.83
SCHEMBL8770081 0.82
SCHEMBL8995998 0.80
SCHEMBL5968706 0.78 TSHR (0.44)
SCHEMBL7939368 0.78 TSHR (0.44)
SCHEMBL16883291 0.75
SCHEMBL13258463 0.73
SCHEMBL14956713 0.73
SCHEMBL5881396 0.71
SCHEMBL5881449 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109666145-A A kind of fluorosilicon oil and its preparation method and application 佛山市南海区里水镇经济促进局 2019-04-23 CN disclosed
CN-106945313-B The outer silica gel tube preparation method of fluorine in a kind of short fiber reinforced silica gel 北京天元奥特橡塑有限公司 2019-02-22 CN disclosed
CN-106945313-A The outer silica gel tube preparation method of fluorine in a kind of short fiber reinforced silica gel 北京天元奥特橡塑有限公司 2017-07-14 CN disclosed
CN-106832299-A A kind of derivative modified organosilicon damping additives of DOPO and preparation method and application 中国科学院化学研究所 2017-06-13 CN disclosed
CN-101641767-B Silicon dielectric treating agent for use after etching, process for producing semiconductor device, and semiconductor device FUJITSU LTD 2013-10-30 CN disclosed
US-7625636-B2 Insulating-film forming composition, insulating film and preparation process thereof FUJIFILM CORPORATION (JP) 2009-12-01 US disclosed
US-20070073024-A1 dendrimer has a cage polysilsesquioxane at the core portion, and has a polymerizable group at the branched end; cured ladder polymer; mechanical strength; electronic device FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
EP-0604401-B1 Production of a catalyst component for producing crystalline polymers CHISSO CORP (JP) 1997-09-24 EP disclosed
EP-0395391-B1 Catalyst component for producing crystalline polymers and a process for producing the catalyst CHISSO CORP (JP) 1996-09-25 EP disclosed
EP-0564004-B1 A highly stereoregular polypropylene CHISSO CORP (JP) 1996-09-25 EP disclosed
EP-0404519-B1 A process for producing a high-stiffness polypropylene CHISSO CORP (JP) 1996-08-07 EP disclosed
EP-0604401-A2 Production of a catalyst component for producing crystalline polymers CHISSO CORPORATION (JP) 1994-06-29 EP disclosed
EP-0564004-A1 A highly stereoregular polypropylene CHISSO CORPORATION (JP) 1993-10-06 EP disclosed
US-5173540-A Coordination catalyst comprising titanium compound, organo aluminum compound electron donor and a polymer support; transparent, voidless films produced CHISSO CORPORATION (JP) 1992-12-22 US disclosed
US-5077341-A Using coordination catalyst CHISSO CORPORATION (JP) 1991-12-31 US disclosed
EP-0395391-A2 Catalyst component for producing crystalline polymers and a process for producing the catalyst CHISSO CORPORATION (JP) 1990-10-31 EP disclosed