Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 4/20 | 0.61 |
| ▸ | CA2 | P00918 | 2/20 | 0.61 |
| ▸ | CA7 | P43166 | 2/20 | 0.61 |
| ▸ | CA9 | Q16790 | 2/20 | 0.61 |
| ▸ | TACR1 | P25103 | 3/20 | 0.59 |
| ▸ | TSHR | P16473 | 2/20 | 0.56 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.49 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | IDO1 | P14902 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL8589400 | 0.83 | CA1 (0.53) | CA1CA2CA7CA9TACR1 | |
| SCHEMBL4385964 | 0.83 | CA1 (0.66) | CA1CA2CA7CA9TACR1 | |
| SCHEMBL4951286 | 0.83 | CA1 (0.66) | CA1CA2CA7CA9TACR1 | |
| SCHEMBL18394417 | 0.83 | TACR1 (0.63) | CA1CA2CA7CA9TACR1 | |
| SCHEMBL93709 | 0.83 | CA1 (0.66) | CA1CA2CA7CA9TACR1 | |
| SCHEMBL397022 | 0.83 | CA1 (0.78) | CA1CA2CA7CA9TACR1 | |
| SCHEMBL93708 | 0.83 | CA1 (0.66) | CA1CA2CA7CA9TACR1 | |
| SCHEMBL7095981 | 0.83 | TACR1 (0.75) | CA1CA2CA7CA9TACR1 | |
| SCHEMBL22013212 | 0.83 | TACR1 (0.63) | CA1CA2CA7CA9TACR1 | |
| SCHEMBL4382418 | 0.83 | CA1 (0.66) | CA1CA2CA7CA9TACR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101522879-A | Cleaning solution for low-etching thicker photoresist | ANJI MICROELECTRONICS SHANGHAI (CN) | 2009-09-02 | — | — | CN | disclosed |
| EP-0513358-B1 | PROCESS FOR PRODUCING CYCLODEXTRIN DERIVATIVE AND POLYMER CONTAINING CYCLODEXTRIN IMMOBILIZED THEREIN | TOPPAN PRINTING CO LTD (JP) | 1997-10-01 | — | — | EP | disclosed |
| US-5608015-A | Processes for producing cyclodextrin derivatives and polymers containing immobilized cyclodextrin therein | TOPPAN PRINTING CO., LTD. (JP) | 1997-03-04 | — | — | US | disclosed |
| US-5482820-A | LIGHT SENSITIVE ELEMENTS WITH COLLOID LAYERS ON SUPPORTS AND DIHALOGENONITRILOACYLAMINO COMPOUNDS WITH PHENOLIC BIOCIDE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-01-09 | — | — | US | disclosed |
| EP-0513358-A1 | PROCESS FOR PRODUCING CYCLODEXTRIN DERIVATIVE AND POLYMER CONTAINING CYCLODEXTRIN IMMOBILIZED THEREIN | Toppan Printing Co., Ltd. (JP) | 1992-11-19 | — | — | EP | disclosed |