SCHEMBL8776750

SCHEMBL8776750

CCN1C(=CC(=O)c2ccc(OC)cc2)Sc2ccc(Cl)cc21

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 9/20 0.65
ALDH1A1 P00352 9/20 0.65
HSD17B10 Q99714 5/20 0.65
NPSR1 Q6W5P4 4/20 0.65
HPGD P15428 4/20 0.65
KDM4E B2RXH2 4/20 0.65
HTT P42858 3/20 0.65
DYRK1A Q13627 4/20 0.64
CLK1 P49759 4/20 0.64
L3MBTL1 Q9Y468 4/20 0.64
MEN1 O00255 4/20 0.64
KMT2A Q03164 4/20 0.64
CSNK1E P49674 3/20 0.64
CLK3 P49761 3/20 0.64
DYRK1B Q9Y463 3/20 0.64
SMN1; SMN2 Q16637 3/20 0.64
PIM1 P11309 2/20 0.64
CSNK1D P48730 2/20 0.64
CSNK1G2 P78368 2/20 0.64
MAP3K19 Q56UN5 2/20 0.64

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11691726 0.85 CLK1 (0.49) MAPTALDH1A1HSD17B10NPSR1HPGD
SCHEMBL11691721 0.85 CLK1 (0.49) MAPTALDH1A1HSD17B10NPSR1HPGD
SCHEMBL18166904 0.80 CLK1 (0.74) MAPTALDH1A1HSD17B10NPSR1HPGD
SCHEMBL4013240 0.80 CLK1 (0.74) MAPTALDH1A1HSD17B10NPSR1HPGD
SCHEMBL24718937 0.79 MAPT (1.00) MAPTALDH1A1HSD17B10NPSR1HPGD
SCHEMBL2977826 0.78 DYRK1A (1.00) MAPTALDH1A1HSD17B10NPSR1HPGD
SCHEMBL2977830 0.78 DYRK1A (1.00) MAPTALDH1A1HSD17B10NPSR1HPGD
SCHEMBL8030185 0.76 HSD17B10 (0.64) MAPTALDH1A1HSD17B10NPSR1HPGD
SCHEMBL4157023 0.75 DYRK1A (0.76) MAPTALDH1A1HSD17B10NPSR1HPGD
SCHEMBL8031777 0.75 DYRK1A (0.76) MAPTALDH1A1HSD17B10NPSR1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4258123-A UNSATURATED COMPOUND, HALOGENATED TRIAZINE, UNSATURATED KETONE FUJI PHOTO FILM CO., LTD. (JP) 1981-03-24 US claimed
US-4239850-A PHOTOINITIATOR OF AN UNSATURATED KETONE AND A TRIHALOMETHYL TRIAZINE FUJI PHOTO FILM CO., LTD. (JP) 1980-12-16 US claimed
US-4171977-A HEAT RESISTANCE, UNSATURATED MONOMER, PHOTOINITIATOR, CHLORINATED POLYOLEFIN BINDER FUJI PHOTO FILM CO., LTD. (JP) 1979-10-23 US claimed
US-4058398-A ETHYLENICALLY UNSATURATED MONOMER, POLYVINYL BUTYRAL, HETEROCYCLIC NITROGEN PHOTOINITIATOR FUJI PHOTO FILM CO., LTD. (JA) 1977-11-15 US claimed
EP-0490515-B1 Method for preparing lithographic printing plate FUJI PHOTO FILM CO LTD (JP) 1997-10-15 EP disclosed
US-5480762-A Method for preparing lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1996-01-02 US disclosed
EP-0490515-A1 Method for preparing lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1992-06-17 EP disclosed
US-4304838-A FILMS FOR PEELABLE DEVELOPMENT FUJI PHOTO FILM CO., LTD. (JP) 1981-12-08 US disclosed
US-4264710-A AN ETHYLENICALLY UNSATURATED COMPOUND, AND A PHOTOPOLYMERIZATION INIATOR FUJI PHOTO FILM CO., LTD. (JP) 1981-04-28 US disclosed
US-4258123-A UNSATURATED COMPOUND, HALOGENATED TRIAZINE, UNSATURATED KETONE FUJI PHOTO FILM CO., LTD. (JP) 1981-03-24 US disclosed
US-4239850-A PHOTOINITIATOR OF AN UNSATURATED KETONE AND A TRIHALOMETHYL TRIAZINE FUJI PHOTO FILM CO., LTD. (JP) 1980-12-16 US disclosed
US-4197132-A Photopolymer photoresist composition containing rosin tackifier adhesion improver and chlorinated polyolefin FUJI PHOTO FILM CO., LTD. (JP) 1980-04-08 US disclosed
US-4175964-A SUCCESSIVE SURFACE TREATMENT WITH AQUEOUS SOLUTIONS OF PHOSPHORIC ACID AND SILICIC ACID OR ITS SALTS FUJI PHOTO FILM CO., LTD. (JP) 1979-11-27 US disclosed
US-4171977-A HEAT RESISTANCE, UNSATURATED MONOMER, PHOTOINITIATOR, CHLORINATED POLYOLEFIN BINDER FUJI PHOTO FILM CO., LTD. (JP) 1979-10-23 US disclosed
US-4157261-A PHOTOINITIATOR, CHLORINATED POLYOLEFIN BINDER FUJI PHOTO FILM CO., LTD. (JP) 1979-06-05 US disclosed
US-4058398-A ETHYLENICALLY UNSATURATED MONOMER, POLYVINYL BUTYRAL, HETEROCYCLIC NITROGEN PHOTOINITIATOR FUJI PHOTO FILM CO., LTD. (JA) 1977-11-15 US disclosed
US-4050936-A Image forming process with photopolymer layers between a support and a substrate FUJI PHOTO FILM CO., LTD. (JA) 1977-09-27 US disclosed
US-4041017-A Reactive light-sensitive high polymer compound containing furyl pentadienic ester groups and insolubilized by action of heat, light or electron beams FUJI PHOTO FILM CO., LTD. (JA) 1977-08-09 US disclosed
US-3931248-A Reactive high polymer compound FUJI PHOTO FILM CO., LTD. (JA) 1976-01-06 US disclosed