SCHEMBL8776902

SCHEMBL8776902

C[SiH](C)O[Si](C)(C)O[SiH](C)O[Si](C)(C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL120202 0.89
SCHEMBL7896532 0.89
SCHEMBL28291473 0.87
Ammonia Solution, Strong SCHEMBL28252103 0.87
SCHEMBL15525641 0.87
Water SCHEMBL34463673 0.87
SCHEMBL19926937 0.87
SCHEMBL41640 0.84
SCHEMBL10001395 0.84
SCHEMBL18472640 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230192961-A1 PERFLUOROPOLYETHER BLOCK-CONTAINING ORGANOHYDROGENPOLYSILOXANE, AND METHOD FOR PRODUCING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-22 US disclosed
US-9557652-B2 Use of compositions comprising a surfactant and a hydrophobizer for avoiding anti pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below BASF SE (DE) 2017-01-31 US disclosed
US-20160238944-A9 USE OF COMPOSITIONS COMPRISING A SURFACTANT AND A HYDROPHOBIZER FOR AVOIDING ANTI PATTERN COLLAPSE WHEN TREATING PATTERNED MATERIALS WITH LINE-SPACE DIMENSIONS OF 50 NM OR BELOW BASF SE (DE) 2016-08-18 US disclosed
US-20150323871-A1 USE OF COMPOSITIONS COMPRISING A SURFACTANT AND A HYDROPHOBIZER FOR AVOIDING ANTI PATTERN COLLAPSE WHEN TREATING PATTERNED MATERIALS WITH LINE-SPACE DIMENSIONS OF 50 NM OR BELOW BASF SE (DE) 2015-11-12 US disclosed
EP-0475130-B1 Siloxane derivative, its use as emulsifier and cosmetic preparations KAO CORP (JP) 1997-12-03 EP disclosed
US-5466849-A Cosmetics KAO CORPORATION (JP) 1995-11-14 US disclosed
US-5306838-A Cosmetics, storage stability KAO CORPORATION (JP) 1994-04-26 US disclosed
US-5144054-A Reaction Products with Alkenyl Glyceryl Ether KAO CORPORATION (JP) 1992-09-01 US disclosed
EP-0475130-A2 Siloxane derivatives, producing method thereof and agents including siloxane derivative KAO CORPORATION (JP) 1992-03-18 EP disclosed