Tetrapropylammonium

Tetrapropylammonium

SCHEMBL8778178

CCC[N+](CCC)(CCC)CCC.CCC[N+](CCC)(CCC)CCC.CCC[N+](CCC)(CCC)CCC.[O-]B([O-])[O-]

nearest known ligand 0.71

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
SLC22A1 O15245 4/20 0.71
SLC22A2 O15244 1/20 0.44
ALDH1A1 P00352 1/20 0.40
TP53 P04637 1/20 0.40
CYP3A4 P08684 1/20 0.40
ALOX15 P16050 1/20 0.40
TSHR P16473 1/20 0.40
ALOX12 P18054 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
HIF1A Q16665 1/20 0.40
HSD17B10 Q99714 1/20 0.40
DNM1 Q05193 6/20 0.36
LSS P48449 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetrapropylammonium SCHEMBL1470383 0.87 SLC22A1 (0.62) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
Tetrapropylammonium SCHEMBL10770144 0.87 SLC22A1 (0.62) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
Tetrapropylammonium SCHEMBL8778191 0.87 SLC22A1 (0.62) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
Tetrapropylammonium SCHEMBL11636486 0.87 SLC22A1 (0.62) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
Tetrapropylammonium SCHEMBL2864463 0.85 SLC22A1 (0.83) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
Tetrapropylammonium SCHEMBL59838 0.84 SLC22A1 (1.00) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
Tetrapropylammonium SCHEMBL5490456 0.84 SLC22A1 (1.00) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
Tetrapropylammonium SCHEMBL240138 0.81 SLC22A1 (0.77) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
Tetrapropylammonium SCHEMBL29033192 0.81 SLC22A1 (0.77) SLC22A1SLC22A2ALDH1A1TP53CYP3A4
Tetrapropylammonium SCHEMBL29659426 0.81 SLC22A1 (0.77) SLC22A1SLC22A2ALDH1A1TP53CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101907835-B Detergent composition for photoresists ANJI MICROELECTRONICS SHANGHAI 2013-08-28 CN claimed
CN-102227689-A Photoresist cleaning agent composition ANJI MICROELECTRONICS SHANGHAI 2011-10-26 CN claimed
CN-101907835-A Detergent composition for photoresists ANJI MICROELECTRONICS SHANGHAI 2010-12-08 CN claimed
CN-101750915-A Semiconductor wafer metal protection liquid and use method thereof ANJI MICROELECTRONICS SHANGHAI 2010-06-23 CN claimed
CN-101750912-A Photoresist detergent composition ANJI MICROELECTRONICS SHANGHAI 2010-06-23 CN claimed
CN-101907835-B Detergent composition for photoresists ANJI MICROELECTRONICS SHANGHAI 2013-08-28 CN disclosed
CN-102227689-A Photoresist cleaning agent composition ANJI MICROELECTRONICS SHANGHAI 2011-10-26 CN disclosed
CN-101907835-A Detergent composition for photoresists ANJI MICROELECTRONICS SHANGHAI 2010-12-08 CN disclosed
CN-101750912-A Photoresist detergent composition ANJI MICROELECTRONICS SHANGHAI 2010-06-23 CN disclosed
CN-101750915-A Semiconductor wafer metal protection liquid and use method thereof ANJI MICROELECTRONICS SHANGHAI 2010-06-23 CN disclosed
EP-0591810-B1 Electrolyte for use in an electrolytic capacitor and the electrolytic capacitor MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 1997-12-29 EP disclosed
US-5485346-A ELECTROLYTE COMPRISING AN ORGANIC SOLVENT, AN AMMONIUM CARBOXYLATE, A SOLUTE AND A POLYETHER MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1996-01-16 US disclosed
EP-0591810-A1 Electrolyte for use in an electrolytic capacitor and the electrolytic capacitor MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1994-04-13 EP disclosed