⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2458744 | 0.71 | — | — | |
| SCHEMBL30726092 | 0.63 | — | — | |
| SCHEMBL11472623 | 0.63 | — | — | |
| SCHEMBL28428656 | 0.63 | — | — | |
| SCHEMBL31248583 | 0.63 | — | — | |
| SCHEMBL5072584 | 0.63 | — | — | |
| SCHEMBL9187387 | 0.63 | — | — | |
| SCHEMBL5420203 | 0.59 | — | — | |
| SCHEMBL9780160 | 0.56 | — | — | |
| SCHEMBL7711925 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2087146-A1 | MULTILAYERED COATINGS FOR USE ON ELECTRONIC DEVICES OR OTHER ARTICLES | The Trustees of Princeton University (US) | 2009-08-12 | — | — | EP | claimed |
| WO-2008063266-A1 | MULTILAYERED COATINGS FOR USE ON ELECTRONIC DEVICES OR OTHER ARTICLES | THE TRUSTEES OF PRINCETON UNIVERSITY (US) | 2008-05-29 | — | — | WO | claimed |
| US-6936309-B2 | Hardness improvement of silicon carboxy films | APPLIED MATERIALS, INC. (US) | 2005-08-30 | — | — | US | claimed |
| WO-2005078155-A1 | ULTRA LOW DIELECTRIC MATERIALS BASED ON HYBRID SYSTEM OF LINEAR SILICON PRECURSOR AND ORGANIC POROGEN | APPLIED MATERIALS, INC. (US) | 2005-08-25 | — | — | WO | claimed |
| EP-1456434-A1 | A METHOD OF DEPOSITING DIELECTRIC MATERIALS IN DAMASCENE APPLICATIONS | Applied Materials, Inc. (US) | 2004-09-15 | — | — | EP | claimed |
| WO-2004070788-A2 | METHOD FOR DEPOSITING A LOW DIELECTRIC CONSTANT FILM | APPLIED MATERIALS INC. (US) | 2004-08-19 | — | — | WO | claimed |
| WO-2004063422-A2 | METHOD FOR CURING LOW DIELECTRIC CONSTANT FILM USING DIRECT CURRENT BIAS | APPLIED MATERIALS, INC. (US) | 2004-07-29 | — | — | WO | claimed |
| WO-2003052162-A1 | A METHOD OF DEPOSITING DIELECTRIC MATERIALS IN DAMASCENE APPLICATIONS | APPLIED MATERIALS, INC. (US) | 2003-06-26 | — | — | WO | claimed |
| US-5744196-A | Low temperature deposition of silicon dioxide using organosilanes | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1998-04-28 | — | — | US | claimed |
| EP-0721019-A2 | Low temperature deposition of silicon dioxide using organosilanes | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1996-07-10 | — | — | EP | claimed |
| EP-3212696-A1 | PROTECTIVE COATING SYSTEM FOR PLASTIC SUBSTRATE | PPG Industries Ohio, Inc. (US) | 2017-09-06 | — | — | EP | disclosed |
| EP-3055139-A1 | PLASMA TREATMENT OF FLEXOGRAPHIC PRINTING SURFACE | 3M Innovative Properties Company (US) | 2016-08-17 | — | — | EP | disclosed |
| WO-2016069807-A1 | PROTECTIVE COATING SYSTEM FOR PLASTIC SUBSTRATE | PPG INDUSTRIES OHIO, INC. (US) | 2016-05-06 | — | — | WO | disclosed |
| EP-2157341-B1 | Cross purge valve and container assembly | AIR PROD & CHEM (US) | 2013-10-09 | — | — | EP | disclosed |
| EP-2619814-A2 | PERMEATION BARRIER FOR ENCAPSULATION OF DEVICES AND SUBSTRATES | Universal Display Corporation (US) | 2013-07-31 | — | — | EP | disclosed |
| EP-1055012-A2 | PLASMA PROCESSES FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS | Applied Materials, Inc. (US) | 2000-11-29 | — | — | EP | disclosed |
| WO-2000024050-A1 | CVD NANOPOROUS SILICA LOW DIELECTRIC CONSTANT FILMS | APPLIED MATERIALS, INC. (US) | 2000-04-27 | — | — | WO | disclosed |
| WO-1999041423-A2 | PLASMA PROCESSES FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS | APPLIED MATERIALS, INC. (US) | 1999-08-19 | — | — | WO | disclosed |
| US-5744196-A | Low temperature deposition of silicon dioxide using organosilanes | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1998-04-28 | — | — | US | disclosed |
| EP-0721019-A2 | Low temperature deposition of silicon dioxide using organosilanes | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1996-07-10 | — | — | EP | disclosed |