⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10256510 | 1.00 | — | — | |
| SCHEMBL18401123 | 0.98 | — | — | |
| SCHEMBL904352 | 0.80 | — | — | |
| SCHEMBL24777448 | 0.79 | — | — | |
| SCHEMBL16604572 | 0.78 | — | — | |
| SCHEMBL14072841 | 0.78 | — | — | |
| SCHEMBL14040552 | 0.78 | — | — | |
| SCHEMBL12996917 | 0.77 | — | — | |
| SCHEMBL12067120 | 0.75 | — | — | |
| SCHEMBL10250127 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2013100158-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-07-04 | — | — | WO | disclosed |
| EP-2434343-A1 | Resist composition, resist film therefrom and method of forming pattern therewith | Fujifilm Corporation (JP) | 2012-03-28 | — | — | EP | disclosed |